Comparison of surface vacuum ultraviolet emissions with resonance level number densities. I. Argon plasmas

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 32, Issue 2, 2014, Pages

  Boffard, John B ^a   Lin, Chun C ^a   Culver, Cody ^a   Wang, Shicong ^a   Wendt, Amy E ^a   Radovanov, Svetlana ^b   Persing, Harold ^b  

^a Wisconsin Electric Machines and Power Electronics Consortium   (United States)

^b VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION SPECTROSCOPY; ARGON; INDUCTIVELY COUPLED PLASMA; LIGHT ABSORPTION; PHOTODIODES; PHOTONS; RADIATION; RESONANCE; SURFACE REACTIONS;

BRANCHING FRACTIONS; EMISSION WAVELENGTH; MATERIAL PROCESSING; NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY; NEUTRAL GAS TEMPERATURES; PRINCIPAL RESONANCE; VACUUM ULTRAVIOLET EMISSION; VACUUM ULTRAVIOLETS;

OPTICAL EMISSION SPECTROSCOPY;

EID: 84893128315     PISSN: 07342101     EISSN: 15208559     Source Type: Journal    
DOI: 10.1116/1.4859376     Document Type: Article

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