SCOPUS 정보 검색 플랫폼

Physica Status Solidi - Rapid Research Letters

Volumn 5, Issue 4, 2011, Pages 165-167

Patterned deposition by plasma enhanced spatial atomic layer deposition

(5) Poodt, Paul a Kniknie, Bas a Branca, Annalisa a Winands, Hans a Roozeboom, Fred a,b

a TNO (Netherlands)

b EINDHOVEN UNIVERSITY OF TECHNOLOGY (Netherlands)

Author keywords

Alumina; Atomic layer deposition; Patterning; Plasma enhanced deposition

Indexed keywords

ATMOSPHERIC PRESSURE PLASMAS; ATOMIC LAYER; FLEXIBLE THIN FILMS; HIGH-THROUGHPUT; IN-LINE; PATTERNED DEPOSITION; PATTERNING; REACTIVE PLASMA SPECIES; TEMPERATURE SENSITIVE SUBSTRATES; TRIMETHYL ALUMINUMS;

ALUMINUM; ATMOSPHERIC PRESSURE; ATOMIC LAYER DEPOSITION; ATOMS; DEPOSITION; FLEXIBLE ELECTRONICS; PLASMA SOURCES;

PLASMA DEPOSITION;

EID: 79954461452 PISSN: 18626254 EISSN: 18626270 Source Type: Journal
DOI: 10.1002/pssr.201004542 Document Type: Letter

Times cited : (19)

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