Influence of aluminium doping on thermoelectric performance of atomic layer deposited ZnO thin films

Applied Physics Letters

Volumn 103, Issue 20, 2013, Pages

  Ruoho, Mikko ^a   Pale, Ville ^a   Erdmanis, Mikhail ^a   Tittonen, Ilkka ^a  

^a AALTO UNIVERSITY   (Finland)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINIUM DOPING; ATOMIC LAYER DEPOSITED; POLYCRYSTALLINE FILM; POWER FACTORS; PULSING SEQUENCES; THERMOELECTRIC PERFORMANCE; THERMOELECTRIC POWER FACTORS; ZNO THIN FILM;

ATOMIC LAYER DEPOSITION; ELECTRIC POWER FACTOR; METALLIC FILMS; THERMOELECTRIC POWER; THERMOELECTRICITY;

SEMICONDUCTOR DOPING;

EID: 84889655409     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4831980     Document Type: Article

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