Crystal orientation dependent thermoelectric properties of highly oriented aluminum-doped zinc oxide thin films

Applied Physics Letters

Volumn 102, Issue 5, 2013, Pages

  Abutaha, A I ^a   Sarath Kumar, S R ^a   Alshareef, H N ^a  

^a KING ABDULLAH UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Saudi Arabia)

Author keywords

[No Author keywords available]

Indexed keywords

AL-DOPED ZINC OXIDE; ALUMINUM-DOPED ZINC OXIDE THIN FILMS; AZO FILMS; C-AXIS ORIENTED FILM; ELECTRICAL CONDUCTIVITY; LASER DEPOSITIONS; ORIENTATION DEPENDENT; POWER FACTORS; SURFACE TERMINATION; THERMOELECTRIC PERFORMANCE; THERMOELECTRIC PROPERTIES;

CRYSTAL ORIENTATION; ELECTRIC CONDUCTIVITY; ELECTRIC POWER FACTOR; LANTHANUM ALLOYS; OPTICAL FILMS; SUBSTRATES; THERMOELECTRIC EQUIPMENT; THIN FILMS; VAPOR DEPOSITION; ZINC OXIDE;

THERMOELECTRICITY;

EID: 84874027775     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4790644     Document Type: Article

References (18)

1. V. Srikant and D. R. Clarke, J. Appl. Phys. 83 (10), 5447 (1998). 10.1063/1.367375
2. M. Snure, D. Toledo, P. Slusser, and A. Tiwari, GaN and ZnO-based Materials and Devices, edited by, S. Pearton, (Springer, Berlin, 2012), Vol. 156, p. 349.
3. M. Ohtaki, T. Tsubota, K. Eguchi, and H. Arai, J. Appl. Phys. 79 (3), 1816 (1996). 10.1063/1.360976
4. M. Snure and A. Tiwari, J. Appl. Phys. 101 (12), 124912 (2007). 10.1063/1.2749487
5. Y. Inoue, M. Okamoto, T. Kawahara, Y. Okamoto, and J. Morimoto, Mater. Trans. 46 (7), 1470 (2005). 10.2320/matertrans.46.1470
6. G. Sun, K. Zhao, Y. Wu, Y. Wang, N. Liu, and L. Zhang, J. Phys.: Condens. Matter 24 (29), 295801 (2012). 10.1088/0953-8984/24/29/295801
7. Y. Kinemuchi, H. Kaga, S. Tanaka, A. Makiya, Z. Kato, K. Uematsu, and K. Watari, Jpn. J. Appl. Phys., Part 2 45, 1212 (2006).
8. K.-F. Lin, C.-J. Pan, and W.-F. Hsieh, Appl. Phys. A 94 (1), 167 (2009). 10.1007/s00339-008-4721-x
9. J. Yao, P. B. Merrill, S. S. Perry, D. Marton, and J. W. Rabalais, J. Chem. Phys. 108 (4), 1645 (1998). 10.1063/1.475535
10. Y.-T. Ho, W.-L. Wang, C.-Y. Peng, M.-H. Liang, J.-S. Tian, C.-W. Lin, and L. Chang, Appl. Phys. Lett. 93 (12), 121911 (2008). 10.1063/1.2988167
11. A. Janotti and C. G. Van de Walle, Appl. Phys. Lett. 87 (12), 122102 (2005). 10.1063/1.2053360
12. D.-H. Cho, J.-H. Kim, B.-M. Moon, Y.-D. Jo, and S.-M. Koo, Appl. Surf. Sci. 255 (6), 3480 (2009). 10.1016/j.apsusc.2008.09.073
13. S. Sub Kim and B.-T. Lee, Thin Solid Films 446 (2), 307 (2004) 10.1016/j.tsf.2003.09.057.
14. C. Detavernier, A. S. Ozcan, J. Jordan-Sweet, E. A. Stach, J. Tersoff, F. M. Ross, and C. Lavoie, Nature 426 (6967), 641 (2003). 10.1038/nature02198
15. F. Bernardini, V. Fiorentini, and D. Vanderbilt, Phys. Rev. B 56 (16), R10024 (1997). 10.1103/PhysRevB.56.R10024
16. M. W. Allen, P. Miller, R. J. Reeves, and S. M. Durbin, Appl. Phys. Lett. 90 (6), 062104 (2007). 10.1063/1.2450642
17. M. W. Allen, C. H. Swartz, T. H. Myers, T. D. Veal, C. F. McConville, and S. M. Durbin, Phys. Rev. B 81 (7), 075211 (2010). 10.1103/PhysRevB.81.075211
18. T. Hiramatsu, M. Furuta, T. Matsuda, C. Li, and T. Hirao, Appl. Surf. Sci. 257 (13), 5480 (2011). 10.1016/j.apsusc.2010.11.128