Spin-on organic polymer dopants for silicon

Journal of Physical Chemistry Letters

Volumn 4, Issue 21, 2013, Pages 3741-3746

  Hoarfrost, Megan L ^a   Takei, Kuniharu ^a,b   Ho, Victor ^a,b   Heitsch, Andrew ^c   Trefonas, Peter ^d   Javey, Ali ^a,b   Segalman, Rachel A ^a,b  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^c DOW CHEMICAL COMPANY   (United States)

^d Dow Electronic Materials   (United States)

Author keywords

dopant diffusion; polymers; rapid thermal annealing; sheet resistance; silicon doping; spin on dopants

Indexed keywords

DOPANT DIFFUSION; DOPING TECHNIQUES; ORGANIC MONOLAYERS; PHOSPHORUS DOPING; PHOSPHORUS-CONTAINING POLYMERS; POLYMER CHEMISTRY; SILICON DOPING; SPIN-ON DOPANT;

BORON; PHOSPHORUS; POLYMER FILMS; POLYMERS; RAPID THERMAL ANNEALING; SEMICONDUCTING FILMS; SEMICONDUCTING SILICON; SEMICONDUCTOR DOPING; SHEET RESISTANCE; SILICON;

ORGANIC POLYMERS;

EID: 84887702341     PISSN: None     EISSN: 19487185     Source Type: Journal    
DOI: 10.1021/jz4019095     Document Type: Article

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