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Volumn 114, Issue 10, 2010, Pages 4331-4335

The Influence of doping on the chemical composition, morphology and electrical properties of Si(1-x)Gex nanowires

Author keywords

[No Author keywords available]

Indexed keywords

ALLOY COMPOSITIONS; CHEMICAL COMPOSITIONS; DIBORANE; DOPANT CONCENTRATIONS; ELECTRICAL PROPERTY; GROWTH PARAMETERS; GROWTH YIELD; NOVEL APPLICATIONS; SEMICONDUCTOR NANOWIRE; SIMULTANEOUS CONTROL;

EID: 77949463329     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp910934h     Document Type: Article
Times cited : (16)

References (39)
  • 30
    • 77949446281 scopus 로고    scopus 로고
    • Note
    • Tapering rate was measured by HRTEM in the following manner:First, the diameter vs length at a few points along the NW was measured (when gold tips were used to define the growth direction). The difference in diameters between two successive points was divided by their distance from each other to calculate the tapering per length unit; 6-8 tapering-rate measurements were taken along each NW and finally averaged. For each growth, the average tapering-rate and error bars were defined by averaging the tapering rate over 8-10 NWs.
  • 39
    • 28144438699 scopus 로고    scopus 로고
    • Wang, Y.; et al. Nano Lett 2005, 5, 2139.
    • (2005) Nano Lett , vol.5 , pp. 2139
    • Wang, Y.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.