-
1
-
-
71049164730
-
-
Digest of Technical Papers
-
J. Mitard, C. Shea, B. De Jaeger, A. Pristera, G. Wang, M. Houssa, G. Eneman, G. Hellings, W. Wang, J. Lin, F. Leys, R. Loo, G. Winderickx, E. Vrancken, A. Stesmans, K. De Meyer, M. Caymax, L. Pantisano, M. Meuris, and M. Heyns, 2009 Symposium on VLSI Technology, Digest of Technical Papers p. 82.
-
2009 Symposium on VLSI Technology
, pp. 82
-
-
Mitard, J.1
Shea, C.2
De Jaeger, B.3
Pristera, A.4
Wang, G.5
Houssa, M.6
Eneman, G.7
Hellings, G.8
Wang, W.9
Lin, J.10
Leys, F.11
Loo, R.12
Winderickx, G.13
Vrancken, E.14
Stesmans, A.15
De Meyer, K.16
Caymax, M.17
Pantisano, L.18
Meuris, M.19
Heyns, M.20
more..
-
2
-
-
79956102299
-
-
C. H. Lee, T. Nishimura, T. Tabata, S. K. Wang, K. Nagashio, K. Kita, and A. Toriumi, Tech. Dig. IEEE Int. Electron Device Meet. (IEDM) 2010, p. 416.
-
(2010)
Tech. Dig. IEEE Int. Electron Device Meet. (IEDM)
, pp. 416
-
-
Lee, C.H.1
Nishimura, T.2
Tabata, T.3
Wang, S.K.4
Nagashio, K.5
Kita, K.6
Toriumi, A.7
-
4
-
-
84887496574
-
-
ECS Trans., 16(10) (2008).
-
(2008)
ECS Trans.
, vol.16
, Issue.10
-
-
-
5
-
-
84885765405
-
-
T. Krishnamohan, D. Kim, T. V. Dinh, A.-t. Pham, B. Meinerzhagen, C. Jungemann, and K. Saraswat, Tech. Dig. IEEE International Electron Device Meeting (IEDM) 2008, p. 899.
-
(2008)
Tech. Dig. IEEE International Electron Device Meeting (IEDM)
, pp. 899
-
-
Krishnamohan, T.1
Kim, D.2
Dinh, T.V.3
Pham, A.-T.4
Meinerzhagen, B.5
Jungemann, C.6
Saraswat, K.7
-
6
-
-
84885829903
-
-
S. Takeuchi, Y. Shimura, T. Nishimura, B. Vincent, G. Eneman, T. Clarysse, J. Demeulemeester, K. Temst, A. Vantomme, J. Dekoster, M. Caymax, R. Loo, O. Nakatsuka, and S. Zaima, Proc. of The Forum on Science and Technology of Si Materials 2010, p. 276.
-
(2010)
Proc. of the Forum on Science and Technology of Si Materials
, pp. 276
-
-
Takeuchi, S.1
Shimura, Y.2
Nishimura, T.3
Vincent, B.4
Eneman, G.5
Clarysse, T.6
Demeulemeester, J.7
Temst, K.8
Vantomme, A.9
Dekoster, J.10
Caymax, M.11
Loo, R.12
Nakatsuka, O.13
Zaima, S.14
-
8
-
-
0142058353
-
-
M. Bauer, C. Ritter, P. A. Crozier, J. Ren, J. Menéndez, G. Wolf, and J. Kouvetakis, Appl. Phys. Lett., 83, 2163 (2003).
-
(2003)
Appl. Phys. Lett.
, vol.83
, pp. 2163
-
-
Bauer, M.1
Ritter, C.2
Crozier, P.A.3
Ren, J.4
Menéndez, J.5
Wolf, G.6
Kouvetakis, J.7
-
9
-
-
77953646930
-
-
J. Xie, A. V. G. Chizmeshya, J. Tolle, V. R. D'Costa, J. Menéndez, and J. Kouvetakis, Chem. Mater., 22(10), 3779 (2010).
-
(2010)
Chem. Mater.
, vol.22
, Issue.10
, pp. 3779
-
-
Xie, J.1
Chizmeshya, A.V.G.2
Tolle, J.3
D'Costa, V.R.4
Menéndez, J.5
Kouvetakis, J.6
-
10
-
-
33845460816
-
-
J. Tolle, V. G. Chizmeshya, Y.-Y. Fang, J. Kouvetakis, V. R. D'Costa, C.-W. Hu, J. Menéndez, and I. S. T. Tsong, Appl. Phys. Lett., 89, 231924 (2006).
-
(2006)
Appl. Phys. Lett.
, vol.89
, pp. 231924
-
-
Tolle, J.1
Chizmeshya, V.G.2
Fang, Y.-Y.3
Kouvetakis, J.4
D'Costa, V.R.5
Hu, C.-W.6
Menéndez, J.7
Tsong, I.S.T.8
-
11
-
-
45149116746
-
-
S. Takeuchi, Y. Shimura, O. Nakatsuka, S. Zaima, M. Ogawa, and A. Sakai, Appl. Phys. Lett., 92, 231916 (2008).
-
(2008)
Appl. Phys. Lett.
, vol.92
, pp. 231916
-
-
Takeuchi, S.1
Shimura, Y.2
Nakatsuka, O.3
Zaima, S.4
Ogawa, M.5
Sakai, A.6
-
12
-
-
84885779856
-
-
A. G. Rodŕiguez, H. Navarro-Contreas, H. Pérez Ladrón de Guevara, and M. A. Vidal, Current Topics in Crystal Growth Research, 7, 47 (2004).
-
(2004)
Current Topics in Crystal Growth Research
, vol.7
, pp. 47
-
-
Rodŕiguez, A.G.1
Navarro-Contreas, H.2
De Ladrón, G.H.3
Vidal, M.A.4
-
13
-
-
36248977518
-
-
G. H. Wang, E.-H. Toh, X. Wang, S. Tripathy, T. Osipowicz, T. K. Chan, K.-M. Hoe, S. Balakumar, G.-Q. Lo, G. Samudra, and Y.-C. Yeo, Appl. Phys. Lett., 91, 202105 (2007).
-
(2007)
Appl. Phys. Lett.
, vol.91
, pp. 202105
-
-
Wang, G.H.1
Toh, E.-H.2
Wang, X.3
Tripathy, S.4
Osipowicz, T.5
Chan, T.K.6
Hoe, K.-M.7
Balakumar, S.8
Lo, G.-Q.9
Samudra, G.10
Yeo, Y.-C.11
-
14
-
-
80054985557
-
-
B. Vincent, F. Gencarelli, H. Bender, C. Merckling, B. Douhard, D. H. Petersen, O. Hansen, H. H. Henrichsen, J. Meersschaut, W. Vandervorst, M. Heyns, R. Loo, and M. Caymax, Appl. Phys. Lett., 99, 152103 (2011).
-
(2011)
Appl. Phys. Lett.
, vol.99
, pp. 152103
-
-
Vincent, B.1
Gencarelli, F.2
Bender, H.3
Merckling, C.4
Douhard, B.5
Petersen, D.H.6
Hansen, O.7
Henrichsen, H.H.8
Meersschaut, J.9
Vandervorst, W.10
Heyns, M.11
Loo, R.12
Caymax, M.13
-
15
-
-
50449109665
-
-
G. H.Wang, E.-H Toh, X. Wang, D. H. L.Seng, S. Tripathy, T.Osipowicz, T. K.Chan, K. M. Hoe, S. Balakumar, C. H. Tung, G. Q. Lo, G. Samudra, and Y.-C. Yeo, Te c h. Dig. IEEE International Electron Device Meeting (IEDM) 2007, p. 131.
-
(2007)
Tech. Dig. IEEE International Electron Device Meeting (IEDM)
, pp. 131
-
-
Wang, G.H.1
Toh, E.-H.2
Wang, X.3
Seng, D.H.L.4
Tripathy, S.5
Osipowicz, T.6
Chan, T.K.7
Hoe, K.M.8
Balakumar, S.9
Tung, C.H.10
Lo, G.Q.11
Samudra, G.12
Yeo, Y.-C.13
-
16
-
-
72249084555
-
-
R. Loo, G. Wang, L. Souriau, J. C. Lin, S. Takeuchi, G. Brammertz, and M. Caymax, J. Electrochem. Soc., 157, H13 (2010).
-
(2010)
J. Electrochem. Soc.
, vol.157
-
-
Loo, R.1
Wang, G.2
Souriau, L.3
Lin, J.C.4
Takeuchi, S.5
Brammertz, G.6
Caymax, M.7
-
17
-
-
79751534826
-
-
B. Vincent, Y. Shimura, S. Takeuchi, T. Nishimura, G. Eneman, A. Firrincieli, J. Demeulemeester, A. Vantomme, T. Clarysse, O. Nakatsuka, S. Zaima, J. Dekoster, M. Caymax, and R. Loo, Microelec. Eng., 88, 342 (2011).
-
(2011)
Microelec. Eng.
, vol.88
, pp. 342
-
-
Vincent, B.1
Shimura, Y.2
Takeuchi, S.3
Nishimura, T.4
Eneman, G.5
Firrincieli, A.6
Demeulemeester, J.7
Vantomme, A.8
Clarysse, T.9
Nakatsuka, O.10
Zaima, S.11
Dekoster, J.12
Caymax, M.13
Loo, R.14
-
20
-
-
84857039902
-
-
G. Hellings, L. Witters, R. Krom, J. Mitard, A. Hikavyy, R. Loo, A. Schulze, G. Eneman, C. Kerner, J. Franco, T. Chiarella, S. Takeoka, J. Tseng, W. Wang, W. Vandervorst, P. Absil, S. Biesemans, M. Heyns, K. De Meyer, M. Meuris, and T. Hoffmann, Tech. Dig. IEEE International Electron Device Meeting (IEDM) 2010, p. 241.
-
(2010)
Tech. Dig. IEEE International Electron Device Meeting (IEDM)
, pp. 241
-
-
Hellings, G.1
Witters, L.2
Krom, R.3
Mitard, J.4
Hikavyy, A.5
Loo, R.6
Schulze, A.7
Eneman, G.8
Kerner, C.9
Franco, J.10
Chiarella, T.11
Takeoka, S.12
Tseng, J.13
Wang, W.14
Vandervorst, W.15
Absil, P.16
Biesemans, S.17
Heyns, M.18
De Meyer, K.19
Meuris, M.20
Hoffmann, T.21
more..
-
21
-
-
80052666440
-
-
Digest of Technical Papers
-
J. Mitard, L. Witters, G. Hellings, R. Krom, J. Franco, G. Eneman, A. Hikavyy, B. Vincent, R. Loo, P. Favia, H. Dekkers, E. Altamirano Sanchez, A. Vanderheyden, D. Vanhaeren, P. Eyben, S. Takeoka, S. Yamaguchi, M. Van Dal, W. Wang, S. Hong, W. Vandervorst, K. De Meyer, S. Biesemans, P. Absil, N. Horiguchi, and T. Hoffmann, 2011 Symposium on VLSI Technology. Digest of Technical Papers, p. 134.
-
2011 Symposium on VLSI Technology
, pp. 134
-
-
Mitard, J.1
Witters, L.2
Hellings, G.3
Krom, R.4
Franco, J.5
Eneman, G.6
Hikavyy, A.7
Vincent, B.8
Loo, R.9
Favia, P.10
Dekkers, H.11
Altamirano Sanchez, E.12
Vanderheyden, A.13
Vanhaeren, D.14
Eyben, P.15
Takeoka, S.16
Yamaguchi, S.17
Van Dal, M.18
Wang, W.19
Hong, S.20
Vandervorst, W.21
De Meyer, K.22
Biesemans, S.23
Absil, P.24
Horiguchi, N.25
Hoffmann, T.26
more..
-
22
-
-
84857061662
-
-
G. Hellings, A. Hikavyy, J. Mitard, L. Witters, B. Benbakhti, A. Alian, N. Waldron, H. Bender, G. Eneman, R. Krom, A. Schulze, W. Vandervorst, R. Loo, M. Heyns, M. Meuris, T. Hoffmann, and K. De Meyer, Thin Solid Films, 520, 3326 (2012).
-
(2012)
Thin Solid Films
, vol.520
, pp. 3326
-
-
Hellings, G.1
Hikavyy, A.2
Mitard, J.3
Witters, L.4
Benbakhti, B.5
Alian, A.6
Waldron, N.7
Bender, H.8
Eneman, G.9
Krom, R.10
Schulze, A.11
Vandervorst, W.12
Loo, R.13
Heyns, M.14
Meuris, M.15
Hoffmann, T.16
De Meyer, K.17
-
23
-
-
71049153735
-
-
Digest of Technical Papers
-
K. Cheng, A. Khakifirooz, P. Kulkarni, S. Kanakasabapathy, S. Schmitz, A. Reznicek, T. Adam, Y. Zhu, J. Li, J. Faltermeier, T. Furukawa, L. F. Edge, B. Haran, S.-C. Seo, P. Jamison, J. Holt, X. Li, R. Loesing, Z. Zhu, R. Johnson, A. Upham, T. Levin, M. Smalley, J. Herman, M. Di, J. Wang, D. Sadana, P. Kozlowski, H. Bu, B. Doris, and J. O'Neill, 2009 Symposium on VLSI Technology. Digest of Technical Papers, p. 212.
-
2009 Symposium on VLSI Technology
, pp. 212
-
-
Cheng, K.1
Khakifirooz, A.2
Kulkarni, P.3
Kanakasabapathy, S.4
Schmitz, S.5
Reznicek, A.6
Adam, T.7
Zhu, Y.8
Li, J.9
Faltermeier, J.10
Furukawa, T.11
Edge, L.F.12
Haran, B.13
Seo, S.-C.14
Jamison, P.15
Holt, J.16
Li, X.17
Loesing, R.18
Zhu, Z.19
Johnson, R.20
Upham, A.21
Levin, T.22
Smalley, M.23
Herman, J.24
Di, M.25
Wang, J.26
Sadana, D.27
Kozlowski, P.28
Bu, H.29
Doris, B.30
O'Neill, J.31
more..
-
24
-
-
79751538113
-
-
B. Benbakhti, K. Kalna, K. Chan, E. Towie, G. Hellings, G. Eneman, K. De Meyer, M. Meuris, and A. Asenov, Microel. Eng., 88(4), 358 (2011).
-
(2011)
Microel. Eng.
, vol.88
, Issue.4
, pp. 358
-
-
Benbakhti, B.1
Kalna, K.2
Chan, K.3
Towie, E.4
Hellings, G.5
Eneman, G.6
De Meyer, K.7
Meuris, M.8
Asenov, A.9
-
25
-
-
84887455536
-
-
Digest of Technical Papers Contribution No 19.2
-
J. Mitard, L. Witters, G. Eneman, G. Hellings, L. Pantisano, A. Hikavyy, R. Loo, P. Eyben, N. Horiguchi, and A. Thean, 2012 Symposium on VLSI Technology. Digest of Technical Papers, Contribution No 19.2.
-
2012 Symposium on VLSI Technology
-
-
Mitard, J.1
Witters, L.2
Eneman, G.3
Hellings, G.4
Pantisano, L.5
Hikavyy, A.6
Loo, R.7
Eyben, P.8
Horiguchi, N.9
Thean, A.10
-
26
-
-
84885781451
-
-
G. Eneman, L. Witters, J. Mitard, G. Hellings, A. De Keersgieter, D. P. Brunco, A Hikavyy, B. Vincent, E. Simoen, P. Favia, H. Bender, A. Veloso, T. Chiarella, G. Boccardi, M. Kim, M. Togo, R. Loo, K. De Meyer, N. Horiguchi, N. Collaert, and A. Thean, ECS Trans., 50(9), 47 (2012).
-
(2012)
ECS Trans.
, vol.50
, Issue.9
, pp. 47
-
-
Eneman, G.1
Witters, L.2
Mitard, J.3
Hellings, G.4
De Keersgieter, A.5
Brunco, D.P.6
Hikavyy, A.7
Vincent, B.8
Simoen, E.9
Favia, P.10
Bender, H.11
Veloso, A.12
Chiarella, T.13
Boccardi, G.14
Kim, M.15
Togo, M.16
Loo, R.17
De Meyer, K.18
Horiguchi, N.19
Collaert, N.20
Thean, A.21
more..
-
27
-
-
84902261427
-
-
Kyoto
-
G. Eneman, A De Keersgieter, L. Witters, J. Mitard, B. Vincent, A. Hikavyy, R. Loo, N. Horiguchi, N. Collaert, and A. Thean, Extended Abstracts of the 2012 International Conference on Solid State Devices and Materials (SSDM), Kyoto, 2012, p. 811.
-
(2012)
Extended Abstracts of the 2012 International Conference on Solid State Devices and Materials (SSDM)
, pp. 811
-
-
Eneman, G.1
De Keersgieter, A.2
Witters, L.3
Mitard, J.4
Vincent, B.5
Hikavyy, A.6
Loo, R.7
Horiguchi, N.8
Collaert, N.9
Thean, A.10
-
28
-
-
84880257295
-
-
B. Vincent, L. Witters, O. Richard, A. Hikavyy, H. Bender, R. Loo, M. Caymax, and A. Thean, ECS Trans., 50(9), 39 (2012).
-
(2012)
ECS Trans.
, vol.50
, Issue.9
, pp. 39
-
-
Vincent, B.1
Witters, L.2
Richard, O.3
Hikavyy, A.4
Bender, H.5
Loo, R.6
Caymax, M.7
Thean, A.8
-
29
-
-
79957818766
-
-
R. Loo, L. Souriau, P. Ong, K. Kenis, J. Rip, P. Storck, T. Buschhardt, and M. Vorderwestner, J. Cryst. Growth, 324(1), 15 (2011).
-
(2011)
J. Cryst. Growth
, vol.324
, Issue.1
, pp. 15
-
-
Loo, R.1
Souriau, L.2
Ong, P.3
Kenis, K.4
Rip, J.5
Storck, P.6
Buschhardt, T.7
Vorderwestner, M.8
-
30
-
-
84885814725
-
-
Proceedings
-
B. Vincent, F. Gencarelli, A. Kumar, A. Vantomme, C. Merckling, D. Lin, V. Afanasiev, G. Eneman, T. Clarysse, A. Firrincieli, A. Gassenq, W. Vandervorst, J. Dekoster, R. Loo, and M. Caymax, 2012 International Silicon-Germanium Technology and Device Meeting (ISTDM), Proceedings, p. 116 (2012).
-
(2012)
2012 International Silicon-Germanium Technology and Device Meeting (ISTDM)
, pp. 116
-
-
Vincent, B.1
Gencarelli, F.2
Kumar, A.3
Vantomme, A.4
Merckling, C.5
Lin, D.6
Afanasiev, V.7
Eneman, G.8
Clarysse, T.9
Firrincieli, A.10
Gassenq, A.11
Vandervorst, W.12
Dekoster, J.13
Loo, R.14
Caymax, M.15
-
33
-
-
84860432856
-
-
S. Gupta, R. Chen, B. Magyari-Kope, H. Lin, B. Yang, A. Nainani, Y. Nishi, J. S. Harris, and K. C. Saraswat, Tech. Dig. IEEE International Electron Device Meeting (IEDM) 2011, p. 398.
-
(2011)
Tech. Dig. IEEE International Electron Device Meeting (IEDM)
, pp. 398
-
-
Gupta, S.1
Chen, R.2
Magyari-Kope, B.3
Lin, H.4
Yang, B.5
Nainani, A.6
Nishi, Y.7
Harris, J.S.8
Saraswat, K.C.9
-
34
-
-
84860353135
-
-
G. Han, S. Su, C. Zhan, Q. Zhou, Y. Yang, L. Wang, P. Guo, W. Wei, C. P. Wong, Z. X. Shen, B. Cheng, and Y.-C. Yeo, Tech. Dig. IEEE International Electron Device Meeting (IEDM) 2011, p. 402.
-
(2011)
Tech. Dig. IEEE International Electron Device Meeting (IEDM)
, pp. 402
-
-
Han, G.1
Su, S.2
Zhan, C.3
Zhou, Q.4
Yang, Y.5
Wang, L.6
Guo, P.7
Wei, W.8
Wong, C.P.9
Shen, Z.X.10
Cheng, B.11
Yeo, Y.-C.12
-
35
-
-
79959684367
-
-
C. Merckling, X. Sun, Y. Shimura, A. Franquet, B. Vincent, S. Takeuchi, W. Vandervorst, O. Nakastuka, S. Zaima, R. Loo, and M. Caymax, Appl. Phys. Lett, 98, 192110 (2011).
-
(2011)
Appl. Phys. Lett
, vol.98
, pp. 192110
-
-
Merckling, C.1
Sun, X.2
Shimura, Y.3
Franquet, A.4
Vincent, B.5
Takeuchi, S.6
Vandervorst, W.7
Nakastuka, O.8
Zaima, S.9
Loo, R.10
Caymax, M.11
-
36
-
-
84857289807
-
-
B. Vincent, F. Gencarelli, D. Lin, L. Nyns, O. Richard, H. Bender, B. Douhard, A. Moussa, C. Merckling, L. Witters, W. Vandervorst, R. Loo, M. Caymax, and M. Heyns, ECS Trans., 41(7), 239 (2011).
-
(2011)
ECS Trans.
, vol.41
, Issue.7
, pp. 239
-
-
Vincent, B.1
Gencarelli, F.2
Lin, D.3
Nyns, L.4
Richard, O.5
Bender, H.6
Douhard, B.7
Moussa, A.8
Merckling, C.9
Witters, L.10
Vandervorst, W.11
Loo, R.12
Caymax, M.13
Heyns, M.14
-
37
-
-
84887416307
-
-
nd
-
nd, 2011.
-
(2011)
nd Ge Workshop GeSn Developments and Future Applications
-
-
Merckling, C.1
Chu, E.2
Sun, X.3
Franquet, A.4
Vincent, B.5
Vandervorst, W.6
Loo, R.7
Caymax, M.8
Afanas'Ev, V.V.9
Dekoster, J.10
-
38
-
-
33846991238
-
-
Y.-Y. Fang, J. Tolle, R. Roucka, A. V. G. Chizmeshya, J. Kouvetakis, V. R. D'Costa, and J. Menéndez, Appl. Phys. Lett, 90, 061915 (2007).
-
(2007)
Appl. Phys. Lett
, vol.90
, pp. 061915
-
-
Fang, Y.-Y.1
Tolle, J.2
Roucka, R.3
Chizmeshya, A.V.G.4
Kouvetakis, J.5
D'Costa, V.R.6
Menéndez, J.7
-
39
-
-
73649148733
-
-
Y. Shimura, N. Tsutsui, O. Nakatsuka, A. Sakai, and S. Zaima, Thin Solid Films, 518, S2 (2010).
-
(2010)
Thin Solid Films
, vol.518
-
-
Shimura, Y.1
Tsutsui, N.2
Nakatsuka, O.3
Sakai, A.4
Zaima, S.5
-
40
-
-
78751469916
-
-
S. Zaima, O. Nakatsuka, Y. Shimura, and S. Takeuchi, 2010 IEEE Int. Conf. on Solid State and Integrated Circuit Techn. (ICSICT), p. 871.
-
2010 IEEE Int. Conf. on Solid State and Integrated Circuit Techn. (ICSICT)
, pp. 871
-
-
Zaima, S.1
Nakatsuka, O.2
Shimura, Y.3
Takeuchi, S.4
-
41
-
-
79955525046
-
-
Y. Shimura, S. Takechi, O. Nakatsuka, A. Sakai, and S. Zaima, Solid State Electonics, 60, 84 (2011).
-
(2011)
Solid State Electonics
, vol.60
, pp. 84
-
-
Shimura, Y.1
Takechi, S.2
Nakatsuka, O.3
Sakai, A.4
Zaima, S.5
-
42
-
-
84885798506
-
-
F. Gencarelli, B. Vincent, J. Demeulemeester, A. Vantomme, A. Moussa, A. Franquet, A. Kumar, J. Meersschaut, W. Vandervorst, R. Loo, M. Caymax, K. Temst, and M. Heyns, ECS Trans., 50(9), 875 (2012).
-
(2012)
ECS Trans.
, vol.50
, Issue.9
, pp. 875
-
-
Gencarelli, F.1
Vincent, B.2
Demeulemeester, J.3
Vantomme, A.4
Moussa, A.5
Franquet, A.6
Kumar, A.7
Meersschaut, J.8
Vandervorst, W.9
Loo, R.10
Caymax, M.11
Temst, K.12
Heyns, M.13
-
44
-
-
84885708473
-
-
R. Pillarisetty, B. Chu-Kung, S. Corcoran, G. Dewey, J. Kavalieros, H. Kennel, R. Kotlyar, V. Le, D. Lionberger, M. Metz, N. Mukherjee, J. Nah, W. Rachmady, M. Radosavljevic, U. Shah, S. Taft, H. Then, N. Zelick, and R. Chau, IEEE International Electron Device Meeting (IEDM) 2010, p. 978.
-
(2010)
IEEE International Electron Device Meeting (IEDM)
, pp. 978
-
-
Pillarisetty, R.1
Chu-Kung, B.2
Corcoran, S.3
Dewey, G.4
Kavalieros, J.5
Kennel, H.6
Kotlyar, R.7
Le, V.8
Lionberger, D.9
Metz, M.10
Mukherjee, N.11
Nah, J.12
Rachmady, W.13
Radosavljevic, M.14
Shah, U.15
Taft, S.16
Then, H.17
Zelick, N.18
Chau, R.19
-
45
-
-
84866554756
-
-
Digest of Technical Papers
-
S. Gupta, B. Vincent, D. Lin, M. Gunji, A.Firrincieli, F. Gencarelli, B. Magyari-Köpe, B. Yang, B. Douhard, J. Delmotte, A. Franquet, M. Caymax, J. Dekoster, Y. Nishi, and K. Saraswat, 2012 Symposium on VLSI Technology. Digest of Technical Papers, p. 95.
-
2012 Symposium on VLSI Technology
, pp. 95
-
-
Gupta, S.1
Vincent, B.2
Lin, D.3
Gunji, M.4
Firrincieli, A.5
Gencarelli, F.6
Magyari-Köpe, B.7
Yang, B.8
Douhard, B.9
Delmotte, J.10
Franquet, A.11
Caymax, M.12
Dekoster, J.13
Nishi, Y.14
Saraswat, K.15
-
46
-
-
84866556393
-
-
Digest of Technical Papers
-
G. Han, S. Su, L. Wang, W. Wang, X. Gong, Y. Yang, Y. Ivana, P. Guo, C. Guo, G. Zhang, J. Pan, Z. Zhang, C. Xue, B. Cheng, and Y-C. Y e o, 2012 Symposium on VLSI Technology. Digest of Technical Papers, p. 97.
-
2012 Symposium on VLSI Technology
, pp. 97
-
-
Han, G.1
Su, S.2
Wang, L.3
Wang, W.4
Gong, X.5
Yang, Y.6
Ivana, Y.7
Guo, P.8
Guo, C.9
Zhang, G.10
Pan, J.11
Zhang, Z.12
Xue, C.13
Cheng, B.14
Yeo, Y.-C.15
-
47
-
-
84867938195
-
-
A. Kumar, F. Gencarelli, A. K. Kambham, M. Gilbert, B. Vincent, and W. Vandervorst, Physica Status Solidi (C), 9(10-11), 1924 (2012).
-
(1924)
Physica Status Solidi (C)
, vol.9
, Issue.10-11
-
-
Kumar, A.1
Gencarelli, F.2
Kambham, A.K.3
Gilbert, M.4
Vincent, B.5
Vandervorst, W.6
-
48
-
-
84887435652
-
-
submitted for publication in Ultramicroscopy
-
A. Kumar, A. K. Kambham, M. Gilbert, F. Gencarelli, B. Vincent, and W. Vandervorst, submitted for publication in Ultramicroscopy.
-
-
-
Kumar, A.1
Kambham, A.K.2
Gilbert, M.3
Gencarelli, F.4
Vincent, B.5
Vandervorst, W.6
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