Realization of thin film encapsulation by atomic layer deposition of Al2O3 at low temperature

Journal of Physical Chemistry C

Volumn 117, Issue 39, 2013, Pages 20308-20312

  Yang, Yong Qiang ^a   Duan, Yu ^a   Chen, Ping ^a   Sun, Feng Bo ^a   Duan, Ya Hui ^a   Wang, Xiao ^a   Yang, Dan ^a  

^a JILIN UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

CONTROLLED ENVIRONMENT; DECAY TIME; GROWTH LAYERS; LOW TEMPERATURES; ORGANIC LIGHT EMITTING DIODES(OLEDS); THIN FILM ENCAPSULATION; WATER VAPOR TRANSMISSION RATE;

ATOMIC LAYER DEPOSITION; DEPOSITION; ORGANIC LIGHT EMITTING DIODES (OLED);

ALUMINUM;

EID: 84885121996     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp406738h     Document Type: Article

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