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Volumn 9, Issue 5, 2008, Pages 667-672

Enhanced OLED performance upon photolithographic patterning by using an atomic-layer-deposited buffer layer

Author keywords

Atomic layer deposition; Conjugated polymer; Electroluminescence; Photolithography

Indexed keywords

ALUMINA; ALUMINUM OXIDE; ATOMS; CHARGE INJECTION; CONJUGATED POLYMERS; ELECTROLUMINESCENCE; ELECTRON INJECTION; IMAGE ENHANCEMENT; ORGANIC LIGHT EMITTING DIODES (OLED); PHOTOLITHOGRAPHY;

EID: 49049100430     PISSN: 15661199     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.orgel.2008.04.009     Document Type: Article
Times cited : (47)

References (33)
  • 7
    • 49049095333 scopus 로고    scopus 로고
    • D.B. Roitman, US Patent, 5,972,419, 1999.
    • D.B. Roitman, US Patent, 5,972,419, 1999.
  • 23


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.