Non-porous low-k dielectric films based on a new structural amorphous fluoropolymer

Advanced Materials

Volumn 25, Issue 35, 2013, Pages 4875-4878

  Yuan, Chao ^a   Jin, Kaikai ^a   Li, Kai ^a   Diao, Shen ^a   Tong, Jiawei ^a   Fang, Qiang ^a  

^a SHANGHAI INSTITUTE OF ORGANIC CHEMISTRY   (China)

Author keywords

dielectric constant; fluoropolymers; insulators; low k materials; thin solid films

Indexed keywords

DENSE MATERIALS; FLUOROPOLYMER; K-VALUES; LOW DIELECTRIC CONSTANTS; LOW-K DIELECTRIC FILMS; LOW-K MATERIALS; THIN SOLID FILM;

DIELECTRIC FILMS; DIELECTRIC LOSSES; ELECTRIC INSULATORS; MECHANICAL PROPERTIES; PERMITTIVITY;

FLUORINE CONTAINING POLYMERS;

EID: 84884908394     PISSN: 09359648     EISSN: 15214095     Source Type: Journal    
DOI: 10.1002/adma.201302021     Document Type: Article

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