Cross-linkable molecular glasses: Low dielectric constant materials patternable in hydrofluoroethers

ACS Applied Materials and Interfaces

Volumn 1, Issue 10, 2009, Pages 2363-2370

  Murotani, Eisuke ^a,b   Lee, Jin Kyun ^a   Chatzichristidi, Margarita ^a   Zakhidov, Alexander A ^a   Taylor, Priscilla G ^a   Schwartz, Evan L ^a   Malliaras, George G ^a   Ober, Christopher K ^a  

^a Cornell University   (United States)

^b ASAHI GLASS CO LTD   (Japan)

Author keywords

cross linking; hydrofluoroethers; low dielectric constant; micropatterning; molecular glass; photolithography

Indexed keywords

ALKYL ETHERS; AMBIENT CONDITIONS; ATOMIC FORCE; CROSS-LINKABLE; CROSS-LINKED FILMS; CROSSLINKING REACTION; DIELECTRIC CONSTANTS; ENVIRONMENTALLY FRIENDLY SOLVENTS; HYDROFLUOROETHERS; LOW DIELECTRIC CONSTANT; LOW DIELECTRIC CONSTANT MATERIALS; LOW-K MATERIALS; MICROPATTERNING; MOLECULAR GLASS; MOLECULAR MATERIALS; NEW APPROACHES; PHOTOLITHOGRAPHIC PATTERNING; PINHOLE-FREE SURFACES; PROCESSABLE; SUBMICROMETER SCALE; THERMALLY STABLE; UNIFORM FILMS;

AMORPHOUS FILMS; ATOMIC FORCE MICROSCOPY; CAPACITANCE MEASUREMENT; DIFFERENTIAL SCANNING CALORIMETRY; ETHERS; GLASS; PHOTOLITHOGRAPHY; POLYMERIC FILMS; SURFACE PROPERTIES;

DIELECTRIC MATERIALS;

EID: 84862833082     PISSN: 19448244     EISSN: 19448252     Source Type: Journal    
DOI: 10.1021/am9004978     Document Type: Article

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