New high strength low-k spin-on thin films for IC application

Macromolecules

Volumn 39, Issue 5, 2006, Pages 1850-1853

  Huang, Yongqing ^a   Economy, James ^b  

^a DUPONT COMPANY   (United States)

^b UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DIELECTRIC BREAKDOWN; POLY((M-DIETHYNYLBENZENE); UV ABSORPTION;

ABSORPTION; BENZENE; INTEGRATED CIRCUITS; PERMITTIVITY; POLYIMIDES; ULTRAVIOLET RADIATION;

THIN FILMS;

EID: 33644937876     PISSN: 00249297     EISSN: None     Source Type: Journal    
DOI: 10.1021/ma0518398     Document Type: Article

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