Review of thin-film silicon deposition techniques for high-efficiency solar cells developed at Panasonic/Sanyo

Solar Energy Materials and Solar Cells

Volumn 119, Issue , 2013, Pages 204-208

  Terakawa, A ^a  

^a PANASONIC CORPORATION   (Japan)

Author keywords

Amorphous silicon; Amorphous silicon germanium; Microcrystalline silicon; Plasma CVD; Solar cell

Indexed keywords

DEPOSITION RATES; EFFICIENCY; MICROCRYSTALLINE SILICON; PLASMA CVD; SILICON SOLAR CELLS; SOLAR CELLS; THIN FILMS;

AMORPHOUS SILICON GERMANIUM; HIGH-EFFICIENCY; HIGH-EFFICIENCY SOLAR CELLS; RECORD EFFICIENCIES; SINGLE JUNCTION; TANDEM JUNCTION; TANDEM SOLAR CELLS; THIN FILM SILICON;

AMORPHOUS SILICON;

EID: 84884904550     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.solmat.2013.06.044     Document Type: Article

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