Microstructures of high-growth-rate (up to 8.3 nm/s) microcrystalline silicon photovoltaic layers and their influence on the photovoltaic performance of thin-film solar cells

Journal of Non-Crystalline Solids

Volumn 354, Issue 19-25, 2008, Pages 2407-2410

  Sobajima, Y ^a   Nakano, S ^a   Nishino, M ^a   Tanaka, Y ^a   Toyama, T ^a   Okamoto, H ^a  

^a OSAKA UNIVERSITY   (Japan)

Author keywords

Chemical vapor deposition; TEM STEM

Indexed keywords

CHEMICAL VAPOR DEPOSITION; GROWTH RATE; MICROSTRUCTURE; PHOTOVOLTAIC CELLS; SOLAR CELLS; TRANSMISSION ELECTRON MICROSCOPY;

CRYSTALLINE VOLUME FRACTION; MICROCRYSTALLINE SILICON PHOTOVOLTAIC LAYERS; THIN-FILM SOLAR CELLS;

MICROCRYSTALLINE SILICON;

EID: 42649124003     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnoncrysol.2007.10.058     Document Type: Article

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