Improved μc-Si p-layer and a-Si i-layer materials using VHF plasma deposition

Conference Record of the IEEE Photovoltaic Specialists Conference

Volumn , Issue , 1997, Pages 591-594

  Deng, X ^a   Jones, S J ^a   Liu, T ^a   Izu, M ^a   Ovshinsky, S R ^a  

^a Energy Conversion Devices Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; CHEMICAL VAPOR DEPOSITION; ELECTRIC CURRENTS; PLASMA APPLICATIONS; QUANTUM EFFICIENCY;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION (PECVD);

SILICON SOLAR CELLS;

EID: 0031380176     PISSN: 01608371     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (7)