Deep sub-wavelength imaging lithography by a reflective plasmonic slab

Optics Express

Volumn 21, Issue 18, 2013, Pages 20683-20691

  Wang, Changtao ^a   Gao, Ping ^a   Zhao, Zeyu ^a   Yao, Na ^a   Wang, Yanqin ^a   Liu, Ling ^a   Liu, Kaipeng ^a   Luo, Xiangang ^a  

^a INSTITUTE OF OPTICS AND ELECTRONICS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

PHOTORESISTS;

CONTROL EXPERIMENTS; HALF PITCHES; NANO PATTERN; NEAR FIELDS; OPTICAL PROXIMITY CORRECTIONS; RESIST PATTERN; SUB-WAVELENGTH;

PLASMONS;

EID: 84884561454     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.21.020683     Document Type: Article

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