Improved near field lithography by surface plasmon resonance in groove-patterned masks

Journal of Optics A: Pure and Applied Optics

Volumn 11, Issue 12, 2009, Pages

  Zeng, Beibei ^a   Pan, Li ^a   Liu, Ling ^a   Fang, Liang ^a   Wang, Changtao ^a   Luo, Xiangang ^a  

^a INSTITUTE OF OPTICS AND ELECTRONICS   (China)

Author keywords

Optical lithography; Surface plasmon

Indexed keywords

DIFFRACTION LIMITS; LIGHT INTENSITY; LITHOGRAPHY PROCESS; METALLIC SLITS; NANO-METER SCALE; NEAR-FIELD LITHOGRAPHY; NUMERICAL CALCULATION; OPTICAL LITHOGRAPHY; OPTICAL TRANSMISSIONS; STRUCTURAL PARAMETER; SUB-WAVELENGTH; SUBWAVELENGTH APERTURES; SURFACE PLASMONS; TRANSMISSION ENHANCEMENT; UNIFORM DISTRIBUTION;

FINITE DIFFERENCE TIME DOMAIN METHOD; LIGHT; METHOD OF MOMENTS; PHOTOLITHOGRAPHY; PLASMONS; SURFACE PLASMON RESONANCE;

LIGHT TRANSMISSION;

EID: 70450195284     PISSN: 14644258     EISSN: 17413567     Source Type: Journal    
DOI: 10.1088/1464-4258/11/12/125003     Document Type: Article

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