Increased process latitude in absorbancemodulated lithography via a plasmonic reflector

Optics Express

Volumn 19, Issue 18, 2011, Pages 17790-17798

  Holzwarth, Charles W ^a   Foulkes, John E ^a   Blaikie, Richard J ^a  

^a MACDIARMID INSTITUTE FOR ADVANCED MATERIALS AND NANOTECHNOLOGY   (New Zealand)

Author keywords

[No Author keywords available]

Indexed keywords

PHOTORESISTS; PLASMONS; REFLECTION;

DEPTH OF FOCUS; FAR-FIELD; OPTICAL PATTERNING; PHOTOCHROMIC MOLECULES; PLASMONIC; PROCESS LATITUDES; SUBWAVELENGTH RESOLUTION; THIN LAYERS; TM POLARIZATION;

LITHOGRAPHY;

EID: 80052214536     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.19.017790     Document Type: Article

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