Pursuit of lower Critical Dimensional Uniformity in EUV resists

Journal of Photopolymer Science and Technology

Volumn 26, Issue 5, 2013, Pages 605-610

  Thackeray, James ^a   Cameron, James ^a   Jain, Vipul ^a   LaBeaume, Paul ^a   Coley, Suzanne ^a   Ongayi, Owendi ^a   Wagner, Mike ^a   Rachford, Aaron ^a   Biafore, John ^b  

^a DOW CHEMICAL COMPANY   (United States)

^b KLA Tencor Austin   (United States)

Author keywords

Acid diffusion; Chemical amplification; Photo decomposable base; Photoresist; Polymer bound PAG

Indexed keywords

EID: 84883664396     PISSN: 09149244     EISSN: 13496336     Source Type: Journal    
DOI: 10.2494/photopolymer.26.605     Document Type: Article

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