Contrast improvement with balanced diffusion control of PAG and PDB

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 8325, Issue , 2012, Pages

  Chen, S F ^a   Chang, L L ^a   Chang, Y H ^a   Huang, C C ^a   Chang, C Y ^a   Ku, Y ^a  

^a TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

AFTER-DEVELOPMENT INSPECTIONS; DIFFUSION CONTROL; DIFFUSION LENGTH; IMMERSION LITHOGRAPHY; MATCHING CONTROL; MINIMUM FEATURE SIZES; OPTICAL CONTRAST; PATTERN FIDELITY; PROCESS DEVELOPMENT; RESOLUTION ENHANCEMENT TECHNIQUE; RESOLUTION LIMITS; SCATTERING BARS; SEMICONDUCTOR MANUFACTURING;

ELECTRON BEAM LITHOGRAPHY; SEMICONDUCTOR DEVICE MANUFACTURE;

DIFFUSION;

EID: 84861059261     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.915802     Document Type: Conference Paper

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