Application of stochastic modeling to resist optimization problems

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 8325, Issue , 2012, Pages

  Biafore, John J ^a   Smith, Mark D ^a  

^a KLA Tencor Austin   (United States)

Author keywords

EUV photoresist; LER; Line edge roughness; Line width roughness; LWR; PDB; Photodecomposable base; RLS; Stochastic modeling

Indexed keywords

LER; LINE EDGE ROUGHNESS; LINEWIDTH ROUGHNESS; LWR; PDB; PHOTODECOMPOSABLE BASE; RLS; STOCHASTIC MODELING;

COMPUTER SIMULATION; PHOTORESISTS; QUANTUM YIELD; ROUGHNESS MEASUREMENT; STOCHASTIC MODELS;

LOADING;

EID: 84861073982     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.916518     Document Type: Conference Paper

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