Application of photodecomposable base concept to two-component deep-UV chemically amplified resists

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2724, Issue , 1996, Pages 186-195

  Funato, S ^a   Kawasaki, N ^a   Kinoshita, Yoshiaki ^a   Masuda, Seiya ^a   Okazaki, Hiroshi ^a   Padmanaban, Munirathna ^a   Yamamoto, T ^a   Pawlowski, Georg ^a  

^a SANOFI   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ACIDS; DECOMPOSITION; PHOTOLYSIS; PHOTOSENSITIVITY; POLYMERS; STABILITY; ULTRAVIOLET RADIATION;

DEEP-ULTRAVIOLET RESISTS; PHOTOACID GENERATORS; PHOTODECOMPOSABLE BASES;

PHOTORESISTS;

EID: 0029768150     PISSN: None     EISSN: None     Source Type: None    
DOI: 10.1117/12.241816     Document Type: Conference Paper

References (15)