-
1
-
-
0022717983
-
Fabrication of microstructures with high aspect ratios and structural heights by synchrotron radiation lithography, galvanoforming, and plastic moulding (LIGA process)
-
Becker E.W., Ehrfeld W., Hagmann P., Maner A., Münchmeyer D. Fabrication of microstructures with high aspect ratios and structural heights by synchrotron radiation lithography, galvanoforming, and plastic moulding (LIGA process). Microelectronic Engineering 1986, 4:35-36.
-
(1986)
Microelectronic Engineering
, vol.4
, pp. 35-36
-
-
Becker, E.W.1
Ehrfeld, W.2
Hagmann, P.3
Maner, A.4
Münchmeyer, D.5
-
3
-
-
0000518739
-
LIGA technologies and applications
-
Hruby J. LIGA technologies and applications. MRS Bulletin 2001, 26(4):337-340.
-
(2001)
MRS Bulletin
, vol.26
, Issue.4
, pp. 337-340
-
-
Hruby, J.1
-
4
-
-
0347603968
-
Applications of LIGA technology to precision manufacturing of high-aspect-ratio micro-components and -systems: a review
-
Malek C.K., Saile V. Applications of LIGA technology to precision manufacturing of high-aspect-ratio micro-components and -systems: a review. Microelectronics J. 2004, 35:131-143.
-
(2004)
Microelectronics J.
, vol.35
, pp. 131-143
-
-
Malek, C.K.1
Saile, V.2
-
5
-
-
10844264478
-
Fabrication and preliminary testing of X-ray lenses in thick SU-8 resist layers
-
Nazmov V., Reznikova E., Mohr J., Snigirev A., Snigireva I., Achenbach S., Saile V. Fabrication and preliminary testing of X-ray lenses in thick SU-8 resist layers. Microsystem Technologies 2004, 10:716-721.
-
(2004)
Microsystem Technologies
, vol.10
, pp. 716-721
-
-
Nazmov, V.1
Reznikova, E.2
Mohr, J.3
Snigirev, A.4
Snigireva, I.5
Achenbach, S.6
Saile, V.7
-
6
-
-
18744378268
-
Ultra-deep X-ray lithography of densely packed SU-8 features: I. An SU-8 casting procedure to obtain uniform solvent content with accompanying experimental results
-
Becnel C., Desta Y., Kelly K. Ultra-deep X-ray lithography of densely packed SU-8 features: I. An SU-8 casting procedure to obtain uniform solvent content with accompanying experimental results. J. Micromech. Microeng. 2005, 15:1242-1248.
-
(2005)
J. Micromech. Microeng.
, vol.15
, pp. 1242-1248
-
-
Becnel, C.1
Desta, Y.2
Kelly, K.3
-
7
-
-
0007897903
-
SU-8 as resist material for deep X-ray lithography
-
Cremers C., Bouamrane F., Singleton L., Schenk R. SU-8 as resist material for deep X-ray lithography. Microsyst. Technol. 2001, 7:6-11.
-
(2001)
Microsyst. Technol.
, vol.7
, pp. 6-11
-
-
Cremers, C.1
Bouamrane, F.2
Singleton, L.3
Schenk, R.4
-
8
-
-
0036883216
-
Acid catalyst mobility in resist resin
-
Stewart M., Tran H., Schmid G., Stachowiak T., Becker D., Willson G. Acid catalyst mobility in resist resin. J. Vac. Sci. Technol. B 2002, 20:2946-2952.
-
(2002)
J. Vac. Sci. Technol. B
, vol.20
, pp. 2946-2952
-
-
Stewart, M.1
Tran, H.2
Schmid, G.3
Stachowiak, T.4
Becker, D.5
Willson, G.6
-
11
-
-
85145626649
-
Univ. California (Berkeley), Intro Synchrotron Radiation,
-
D. Attwood, Univ. California (Berkeley), Intro Synchrotron Radiation, Bending Magnet Radiation, EE290F (Feb. 8, 2007).
-
Bending Magnet Radiation, EE290F (Feb. 8, 2007).
-
-
Attwood, D.1
-
12
-
-
0027577472
-
Examination of the solubility and the molecular weight distribution of PMMA in view of an optimised resist system in deep etch X-ray lithography
-
El-Kholi A., Bley P., Göttert J., Mohr J. Examination of the solubility and the molecular weight distribution of PMMA in view of an optimised resist system in deep etch X-ray lithography. Microectronic Engineering 1983, 21:271-274.
-
(1983)
Microectronic Engineering
, vol.21
, pp. 271-274
-
-
El-Kholi, A.1
Bley, P.2
Göttert, J.3
Mohr, J.4
-
14
-
-
0009145773
-
Structural changes in poly(methyl methacrylate) during deep-etch X-ray synchroton radiation litography. Part II: Radiation effects on PMMA
-
Schmalz O., Hess M., Kosfeld R. Structural changes in poly(methyl methacrylate) during deep-etch X-ray synchroton radiation litography. Part II: Radiation effects on PMMA. Die Angewandte makromolekulare Chemie 1996, 239:79-91.
-
(1996)
Die Angewandte makromolekulare Chemie
, vol.239
, pp. 79-91
-
-
Schmalz, O.1
Hess, M.2
Kosfeld, R.3
-
16
-
-
0016535487
-
Developer characteristics of poly-(methyl electron resist methacrylate)
-
Greeneich J.S. Developer characteristics of poly-(methyl electron resist methacrylate). J. Electrochem. Soc. 1975, 122:970-976.
-
(1975)
J. Electrochem. Soc.
, vol.122
, pp. 970-976
-
-
Greeneich, J.S.1
-
17
-
-
0032291285
-
Resist dissolution rate and inclined-wall structures in deep x-ray lithography
-
Liu Z., Bouamrane F., Rouilliay M., Kupka R., Labeque A., Metgert S. Resist dissolution rate and inclined-wall structures in deep x-ray lithography. J. Micromech. Microeng. 1998, 8:293-300.
-
(1998)
J. Micromech. Microeng.
, vol.8
, pp. 293-300
-
-
Liu, Z.1
Bouamrane, F.2
Rouilliay, M.3
Kupka, R.4
Labeque, A.5
Metgert, S.6
-
18
-
-
0033309897
-
Study of the development behavior of irradiated foils and microstructure
-
Meyer P., El-Kholi A., Mohr J., Cremers C., Bouamrane F., Metgert S. Study of the development behavior of irradiated foils and microstructure. SPIE 1999, 3874:312-320.
-
(1999)
SPIE
, vol.3874
, pp. 312-320
-
-
Meyer, P.1
El-Kholi, A.2
Mohr, J.3
Cremers, C.4
Bouamrane, F.5
Metgert, S.6
-
19
-
-
0036722932
-
Investigations of the development rate of irradiated PMMA microstructures in deep X-ray lithography
-
Meyer P., El-Kholi A., Schulz J. Investigations of the development rate of irradiated PMMA microstructures in deep X-ray lithography. Microelectronic Engineering 2002, 63:319-328.
-
(2002)
Microelectronic Engineering
, vol.63
, pp. 319-328
-
-
Meyer, P.1
El-Kholi, A.2
Schulz, J.3
-
20
-
-
0000543565
-
Influence of developer temperature and resist material on the structure quality in deep x-ray lithography
-
Pantenburg F.J., Achenbach S., Mohr J. Influence of developer temperature and resist material on the structure quality in deep x-ray lithography. J. Vac. Sci. Technol. 1998, 16:3547-3551.
-
(1998)
J. Vac. Sci. Technol.
, vol.16
, pp. 3547-3551
-
-
Pantenburg, F.J.1
Achenbach, S.2
Mohr, J.3
-
21
-
-
0037329626
-
DoseSim: MS-Windows Graphical User Interface for using synchrotron X-ray exposure and subsequent development in the LIGA process
-
Meyer P., Schulz J., Hahn L. DoseSim: MS-Windows Graphical User Interface for using synchrotron X-ray exposure and subsequent development in the LIGA process. Review of Scientific Instruments 2002, 74(2):1113-1119.
-
(2002)
Review of Scientific Instruments
, vol.74
, Issue.2
, pp. 1113-1119
-
-
Meyer, P.1
Schulz, J.2
Hahn, L.3
-
22
-
-
84944729507
-
X3D: 3D X-ray lithography and development simulation for MEMS,
-
Transducers'03 (2003)
-
S. Hafizovic et al., X3D: 3D X-ray lithography and development simulation for MEMS, Transducers'03 (2003) 1570-1573.
-
-
-
Hafizovic, S.1
-
24
-
-
0033353368
-
The influence of feature sidewall tolerance on minimum absorber thickness for LIGA X-ray masks
-
Griffiths S.K., Hruby J.M., Ting A. The influence of feature sidewall tolerance on minimum absorber thickness for LIGA X-ray masks. J. Micromech. Microeng. 1999, 9:353-361.
-
(1999)
J. Micromech. Microeng.
, vol.9
, pp. 353-361
-
-
Griffiths, S.K.1
Hruby, J.M.2
Ting, A.3
-
25
-
-
3142666016
-
Fundamental limitations of LIGA X-ray lithography: sidewall offset, slope and minimum feature size
-
Griffiths S.K. Fundamental limitations of LIGA X-ray lithography: sidewall offset, slope and minimum feature size. J. Micromech. Microeng. 2004, 14:999-1011.
-
(2004)
J. Micromech. Microeng.
, vol.14
, pp. 999-1011
-
-
Griffiths, S.K.1
-
26
-
-
14744283171
-
Three dimensional imaging of LIGA-made microcomponents
-
Chinn D., Ostendorp P., Haugh M., Kershmann R., Kurgess T., Claudet A., Tucker T. Three dimensional imaging of LIGA-made microcomponents. J. of Manufacturing Science and Engineering 2004, 126:813-821.
-
(2004)
J. of Manufacturing Science and Engineering
, vol.126
, pp. 813-821
-
-
Chinn, D.1
Ostendorp, P.2
Haugh, M.3
Kershmann, R.4
Kurgess, T.5
Claudet, A.6
Tucker, T.7
-
27
-
-
0036493917
-
Recent developments in dimensional metrology for microsystem components
-
Cao S., Brand U., Kleine-Bestent T., Hoffmann W., Schwenke H., Bütefisch S., Büttgenbach S. Recent developments in dimensional metrology for microsystem components. J. Microsystem Technologies 2002, 8:3-6.
-
(2002)
J. Microsystem Technologies
, vol.8
, pp. 3-6
-
-
Cao, S.1
Brand, U.2
Kleine-Bestent, T.3
Hoffmann, W.4
Schwenke, H.5
Bütefisch, S.6
Büttgenbach, S.7
-
28
-
-
27844438958
-
A Micro-CMM with metrology frame for low uncertainty measurements, measurement science and technology
-
Brand U., Kirchhoff J. A Micro-CMM with metrology frame for low uncertainty measurements, measurement science and technology. Meas. Sci. Technol. 2005, 16:2489-2497.
-
(2005)
Meas. Sci. Technol.
, vol.16
, pp. 2489-2497
-
-
Brand, U.1
Kirchhoff, J.2
-
29
-
-
21044442381
-
MODULIGA: the LIGA process as a modular production method-current standardization status in Germany
-
Hahn L., Meyer P., Bade K., Hein H., Schulz J., Löchel B., Scheunemann H., Schondelmaier D., Singleton L. MODULIGA: the LIGA process as a modular production method-current standardization status in Germany. Micr. Tech. 2005, 11:240-245.
-
(2005)
Micr. Tech.
, vol.11
, pp. 240-245
-
-
Hahn, L.1
Meyer, P.2
Bade, K.3
Hein, H.4
Schulz, J.5
Löchel, B.6
Scheunemann, H.7
Schondelmaier, D.8
Singleton, L.9
-
30
-
-
84974961354
-
Microspectrometer fabricated by the LIGA process
-
Müller C., Mohr J. Microspectrometer fabricated by the LIGA process. Interdisciplinary Science Reviews 1993, 18(3):273-279.
-
(1993)
Interdisciplinary Science Reviews
, vol.18
, Issue.3
, pp. 273-279
-
-
Müller, C.1
Mohr, J.2
-
31
-
-
49949107571
-
Why you will use the deep X-ray LIG(A) technology to produce MEMS?
-
Meyer P., Schulz J., Hahn L., Saile V. Why you will use the deep X-ray LIG(A) technology to produce MEMS?. Microsystem Technologies 2008, 14(9-11):1491-1497.
-
(2008)
Microsystem Technologies
, vol.14
, Issue.9-11
, pp. 1491-1497
-
-
Meyer, P.1
Schulz, J.2
Hahn, L.3
Saile, V.4
|