Fabrication and preliminary testing of X-ray lenses in thick SU-8 resist layers

Microsystem Technologies

Volumn 10, Issue 10, 2004, Pages 716-721

  Nazmov, V ^a   Reznikova, E ^a   Mohr, J ^a   Snigirev, A ^b   Snigireva, I ^b   Achenbach, S ^a   Saile, V ^a  

^a KARLSRUHE INSTITUTE OF TECHNOLOGY   (Germany)

^b EUROPEAN SYNCHROTRON RADIATION FACILITY   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION; FABRICATION; LENSES; LUMINESCENCE; MICROMETERS; MICROSTRUCTURE; SILICON WAFERS;

CRYSTALLINITY; RADIATION STABILITY; SU-8 POLYMER MATERIALS; X-RAY LENSES;

LITHOGRAPHY;

EID: 10844264478     PISSN: 09467076     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00542-004-0433-0     Document Type: Conference Paper

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