Advanced indium tin oxide ceramic sputtering targets (rotary and planar) for transparent conductive nanosized films

Advances in Applied Ceramics

Volumn 112, Issue 5, 2013, Pages 243-256

  Medvedovski, E ^a   Alvarez, N A ^a   Szepesi, C J ^a   Yankov, O ^a   Lippens, P ^b  

^a R and D Optical Coating Materials   (United States)

^b UMICORE   (Belgium)

Author keywords

Indium tin oxide; Sintering; Sputtering target; Transparent conductive thin film

Indexed keywords

AMORPHOUS STRUCTURES; DIRECT CURRENT MAGNETRON SPUTTERING; INDIUM TIN OXIDE; MICROCRYSTALLINE STRUCTURES; SPUTTERING TARGET; THEORETICAL DENSITY; TRANSPARENT CONDUCTIVE; TRANSPARENT CONDUCTIVE THIN FILMS;

CERAMIC MATERIALS; ELECTRIC CONDUCTIVITY; FLAT PANEL DISPLAYS; SINTERING; THIN FILMS; TIN;

CONDUCTIVE FILMS;

EID: 84880691495     PISSN: 17436753     EISSN: 17436761     Source Type: Journal    
DOI: 10.1179/1743676112Y.0000000066     Document Type: Article

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