Low resistivity ITO film prepared using the ultra high density ITO target

Thin Solid Films

Volumn 334, Issue 1-2, 1998, Pages 30-34

  Utsumi, Kentaro ^a   Matsunaga, Osamu ^a   Takahata, Tsutomu ^a  

^a TOSOH CORPORATION   (Japan)

Author keywords

ITO; Resistivity; Sputtering target

Indexed keywords

CARRIER CONCENTRATION; ELECTRIC CONDUCTIVITY OF SOLIDS; FILM PREPARATION; HALL EFFECT; INDIUM COMPOUNDS; MAGNETIC FIELD MEASUREMENT; MAGNETRON SPUTTERING; SINTERING; THIN FILMS;

INDIUM TIN OXIDE;

CONDUCTIVE FILMS;

EID: 0032483865     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)01111-0     Document Type: Article

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