Thin films engineering of indium tin oxide: Large area flat panel displays application

Surface and Coatings Technology

Volumn 200, Issue 20-21, 2006, Pages 5751-5759

  Betz, U ^a   Kharrazi Olsson, M ^a   Marthy, J ^a   Escola M F ^a   Atamny, F ^a  

^a Department for Research and Development   (Germany)

Author keywords

DC magnetron sputtering; Displays application; Indium tin oxide; Large area coating; Microstructure

Indexed keywords

CRYSTAL MICROSTRUCTURE; DEPOSITION; ETCHING; FLAT PANEL DISPLAYS; MAGNETRON SPUTTERING; MORPHOLOGY; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR DEVICE MANUFACTURE; SURFACE ROUGHNESS; THIN FILMS;

DISPLAYS APPLICATION; ETCHING PROPERTIES; INDIUM TIN OXIDE; LARGE AREA COATING; ROOM TEMPERATURE DEPOSITION;

INDIUM COMPOUNDS;

CRYSTAL MICROSTRUCTURE; DEPOSITION; ETCHING; FLAT PANEL DISPLAYS; INDIUM COMPOUNDS; MAGNETRON SPUTTERING; MORPHOLOGY; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR DEVICE MANUFACTURE; SURFACE ROUGHNESS; THIN FILMS;

EID: 33646487911     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2005.08.144     Document Type: Article

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