Chemical instability of the target surface during DC-magnetron sputtering of ITO-coatings

Thin Solid Films

Volumn 317, Issue 1-2, 1998, Pages 405-408

  Lippens, P ^a   Segers, A ^b   Haemers, J ^b   De Gryse, R ^b  

^a Innov Sputtering Technology (IST)   (Belgium)

^b GHENT UNIVERSITY   (Belgium)

Author keywords

DC magnetron; Indium tin oxide; Plasma

Indexed keywords

CLEANING; CRYSTALS; INDIUM COMPOUNDS; MAGNETRON SPUTTERING; PLASMAS; PLASTIC FILMS; STOICHIOMETRY; SURFACES; THERMODYNAMIC STABILITY;

BLACK CRYSTALS; CHEMICAL INSTABILITY; INDIUM TIN OXIDE COATING; PLASMA EMISSION MONITORING; SURFACE INSTABILITY;

COATINGS;

EID: 0032045448     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)00632-9     Document Type: Article

References (7)

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