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Volumn 517, Issue 16, 2009, Pages 4615-4620
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Effects of air annealing on the optical, electrical, and structural properties of indium-tin oxide thin films
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Author keywords
Ellipsometry; Indium tin oxide; Optical properties; Resistivity
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Indexed keywords
AIR-ANNEALING;
ANNEALING TEMPERATURES;
DIFFRACTION PEAKS;
ELECTRICAL MEASUREMENTS;
ELECTRICAL RESISTIVITIES;
ELECTRICAL-RESISTIVITY MEASUREMENTS;
FILM DEPOSITIONS;
INDIUM-TIN OXIDE;
INFRARED RANGES;
METALLIC BEHAVIORS;
NORMAL INCIDENCES;
PHOTON ENERGIES;
RELATIVE INTENSITIES;
RESIDUAL RESISTIVITIES;
RESISTIVITY;
TRANSMITTANCE SPECTRUM;
UV-VISIBLE;
X- RAY DIFFRACTIONS;
ANNEALING;
DIFFRACTION;
ELECTRIC RESISTANCE;
INFRARED SPECTROSCOPY;
OPTICAL CONSTANTS;
OPTICAL PROPERTIES;
OXIDE FILMS;
SPECTROSCOPIC ELLIPSOMETRY;
THIN FILMS;
TIN;
TITANIUM COMPOUNDS;
INDIUM;
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EID: 65549171145
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/j.tsf.2009.02.134 Document Type: Article |
Times cited : (24)
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References (21)
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