Study on In2O3-SnO2 transparent and conductive films prepared by d.c. sputtering using high density ceramic targets

Thin Solid Films

Volumn 445, Issue 2, 2003, Pages 229-234

  Utsumi, K ^a   Iigusa, H ^a   Tokumaru, R ^b   Song, P K ^b   Shigesato, Y ^b  

^a TOSOH CORPORATION   (Japan)

^b AOYAMA GAKUIN UNIVERSITY   (Japan)

Author keywords

d.c. magnetron sputtering; ITO target; Tin doped indium oxide

Indexed keywords

CARRIER CONCENTRATION; CERAMIC MATERIALS; DEPOSITION; ELECTRIC CONDUCTIVITY; ELECTRIC DISCHARGES; FILM PREPARATION; INDIUM COMPOUNDS; MAGNETRON SPUTTERING; POLYCRYSTALLINE MATERIALS; TIN COMPOUNDS; TRANSPARENCY; X RAY DIFFRACTION ANALYSIS;

D.C. MAGNETRON SPUTTERING; ITO TARGET; TIN-DOPED INDIUM OXIDES;

THIN FILMS;

EID: 1642368022     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(03)01167-2     Document Type: Conference Paper

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