Characterization of indium-tin oxide sputtering targets showing various densities of nodule formation

Thin Solid Films

Volumn 503, Issue 1-2, 2006, Pages 22-28

  Omata, Takahisa ^a   Kita, Masao ^a   Okada, Hideya ^a   Otsuka Yao Matsuo, Shinya ^a   Ono, Naoki ^b   Ikawa, Hiroyuki ^c  

^a OSAKA UNIVERSITY   (Japan)

^b MITSUI MINING AND SMELTING CO LTD   (Japan)

^c KANAGAWA INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Indium oxide; Indium tin oxide; Nodule; Oxygen concentration; Sputtering; Thin film

Indexed keywords

CARRIER CONCENTRATION; DOPING (ADDITIVES); LATTICE CONSTANTS; LIGHT ABSORPTION; MAGNETRON SPUTTERING; SOLID ELECTROLYTES; THIN FILMS; TIN COMPOUNDS;

CONDUCTION ELECTRON DENSITY; INDIUM TIN OXIDE; NODULE; RELATIVE DENSITY;

INDIUM COMPOUNDS;

EID: 33644760339     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.09.200     Document Type: Article

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