Photo-thermal chemical vapor deposition of graphene on copper

Carbon

Volumn 62, Issue , 2013, Pages 43-50

  Riikonen, Juha ^a   Kim, Wonjae ^a   Li, Changfeng ^a   Svensk, Olli ^a   Arpiainen, Sanna ^b   Kainlauri, Markku ^b   Lipsanen, Harri ^a  

^a AALTO UNIVERSITY   (Finland)

^b VTT TECHNICAL RESEARCH CENTRE OF FINLAND   (Finland)

Author keywords

[No Author keywords available]

Indexed keywords

CMOS PROCESSING; CRYSTALLINE QUALITY; GRAPHENE FILMS; HIGH TEMPERATURE; HIGH THROUGHPUT; LOW DEFECT DENSITIES; PHOTO-THERMAL; SYNTHESIS PROCESS;

CHEMICAL VAPOR DEPOSITION; COPPER; ELECTRONIC PROPERTIES; FABRICATION; METHANE; RAPID THERMAL PROCESSING; VAPORS;

GRAPHENE;

EID: 84880320394     PISSN: 00086223     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.carbon.2013.05.050     Document Type: Article

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