Photo-thermal chemical vapor deposition growth of graphene

Carbon

Volumn 50, Issue 2, 2012, Pages 668-673

  Tan, Y Y ^a   Jayawardena, K D G I ^a   Adikaari, A A D T ^a   Tan, L W ^a   Anguita, J V ^a   Henley, S J ^a   Stolojan, V ^a   Carey, J D ^a   Silva, S R P ^a  

^a UNIVERSITY OF SURREY   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVE LAYER; COOLING RATES; CU SUBSTRATE; ELECTRICAL AND OPTICAL PROPERTIES; GROWTH TIME; HEATING UP; METHYL ESTERS; NONTHERMAL EQUILIBRIUM; ORGANIC PHOTOVOLTAIC DEVICES; PHOTO-THERMAL; POWER CONVERSION EFFICIENCIES; PROCESSING TEMPERATURE; THERMAL CHEMICAL VAPOR DEPOSITION; TRANSPARENT ELECTRODE MATERIALS;

BUTYRIC ACID; CONVERSION EFFICIENCY; ELECTRIC PROPERTIES; FATTY ACIDS; GRAPHENE; OPTICAL PROPERTIES; PHOTOVOLTAIC EFFECTS; PROCESSING; SYNTHESIS (CHEMICAL); THIOPHENE;

CHEMICAL VAPOR DEPOSITION;

EID: 80055074470     PISSN: 00086223     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.carbon.2011.09.025     Document Type: Article

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