Progress in resolution, sensitivity and critical dimensional uniformity of EUV chemically amplified resists

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 8682, Issue , 2013, Pages

  Thackeray, James ^a   Cameron, James ^a   Jain, Vipul ^a   LaBeaume, Paul ^a   Coley, Suzanne ^a   Ongayi, Owendi ^a   Wagner, Mike ^a   Rachford, Aaron ^a   Biafore, John ^b  

^a DOW CHEMICAL COMPANY   (United States)

^b KLA Tencor Austin   (United States)

Author keywords

Acid diffusion; Chemical amplification; Photo decomposable base; Photoresist; Polymer bound PAG

Indexed keywords

ACID DIFFUSION; CHEMICAL AMPLIFICATION; CHEMICALLY AMPLIFIED RESIST; CRITICAL DIMENSION UNIFORMITIES; GENERATING EFFICIENCIES; PHOTO-DECOMPOSABLE BASE; PHOTOACID GENERATORS; POLYMER-BOUND PAG;

PHOTORESISTORS; PHOTORESISTS;

LITHOGRAPHY;

EID: 84878415161     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.2011565     Document Type: Conference Paper

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