Modeling of the self-limited growth in catalytic chemical vapor deposition of graphene

New Journal of Physics

Volumn 15, Issue , 2013, Pages

  Kim, Hokwon ^a   Saiz, Eduardo ^a   Chhowalla, Manish ^b   Mattevi, Cecilia ^a  

^a IMPERIAL COLLEGE LONDON   (United Kingdom)

^b Piscataway   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CATALYTIC CHEMICAL VAPOR DEPOSITION; CRYSTALLINE GRAINS; EXPERIMENTAL DATUM; LANGMUIR ADSORPTION THEORY; NUCLEATION AND GROWTH; POLYCRYSTALLINE GRAPHENE; PROSPECTIVE APPLICATIONS; SELF-LIMITED GROWTH;

CHEMICAL VAPOR DEPOSITION; METHANE;

GRAPHENE;

EID: 84878258907     PISSN: 13672630     EISSN: None     Source Type: Journal    
DOI: 10.1088/1367-2630/15/5/053012     Document Type: Article

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