Large scale atmospheric pressure chemical vapor deposition of graphene

Carbon

Volumn 54, Issue , 2013, Pages 58-67

  Vlassiouk, Ivan ^a   Fulvio, Pasquale ^a   Meyer, Harry ^a   Lavrik, Nick ^a   Dai, Sheng ^a   Datskos, Panos ^a   Smirnov, Sergei ^b,c  

^a OAK RIDGE NATIONAL LABORATORY   (United States)

^b NEW MEXICO STATE UNIVERSITY   (United States)

^c NM Devices LLC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATMOSPHERIC PRESSURE CHEMICAL VAPOR DEPOSITION; CLEANING PROTOCOLS; COPPER FOILS; CRYSTALLOGRAPHIC ORIENTATIONS; GRAPHENE GROWTH; GRAPHENE LAYERS; GROWTH CONDITIONS; HIGH QUALITY; HIGH TEMPERATURE; INDUSTRIAL SCALE; INTER-DOMAIN; LOW PRESSURE CVD; POLYMER SUBSTRATE; ROLL TO ROLL; SINGLE LAYER;

ATMOSPHERIC PRESSURE; CHEMICAL VAPOR DEPOSITION; OPTIMIZATION; POLYETHYLENE TEREPHTHALATES; SUBSTRATES; VAPORS;

GRAPHENE;

EID: 84872863419     PISSN: 00086223     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.carbon.2012.11.003     Document Type: Article

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