-
2
-
-
9744248669
-
Room-temperature fabrication of transparent flexible thin-film transistors using amorphous oxide semiconductors
-
DOI 10.1038/nature03090
-
K. Nomura, H. Ohta, A. Takagi, T. Kamiya, M. Hirano, and H. Hosono, "Room-temperature fabrication of transparent flexible thin-film transistors using amorphous oxide semiconductors," Nature, vol. 432, no. 7016, pp. 488-492, Nov. 2004. (Pubitemid 39585210)
-
(2004)
Nature
, vol.432
, Issue.7016
, pp. 488-492
-
-
Nomura, K.1
Ohta, H.2
Takagi, A.3
Kamiya, T.4
Hirano, M.5
Hosono, H.6
-
3
-
-
78149382528
-
Present status of amorphous In-Ga-Zn-O thin-film transistors
-
Aug.
-
T. Kamiya, K. Nomura, and H. Hosono, "Present status of amorphous In-Ga-Zn-O thin-film transistors," Sci. Technol. Adv. Mater., vol. 11, no. 4, p. 044305, Aug. 2010.
-
(2010)
Sci. Technol. Adv. Mater.
, vol.11
, Issue.4
, pp. 044305
-
-
Kamiya, T.1
Nomura, K.2
Hosono, H.3
-
4
-
-
22944469098
-
Recent advances in ZnO transparent thin film transistors
-
DOI 10.1016/j.tsf.2005.01.066, PII S0040609005000957, International Conference on Polycrystalline Semiconductors-Materials, Technologies, Device Applications
-
E. Fortunato, P. Barquinha, A. Pimentel, A. Gonçalves, A. Marques, L. Pereira, and R. Martins, "Recent advances in ZnO transparent thin film transistors," Thin Solid Films, vol. 487, nos. 1-2, pp. 205-211, Mar. 2005. (Pubitemid 41046321)
-
(2005)
Thin Solid Films
, vol.487
, Issue.1-2
, pp. 205-211
-
-
Fortunato, E.1
Barquinha, P.2
Pimentel, A.3
Goncalves, A.4
Marques, A.5
Pereira, L.6
Martins, R.7
-
5
-
-
78650292845
-
Recent progress on ZnO-based metalsemiconductor field-effect transistors and their application in transparent integrated circuits
-
Dec.
-
H. Frenzel, A. Lajn, H. von Wenckstern, M. Lorenz, F. Schein, Z. Zhang, and M. Grundmann, "Recent progress on ZnO-based metalsemiconductor field-effect transistors and their application in transparent integrated circuits," Adv. Mater., vol. 22, no. 47, pp. 5332-5349, Dec. 2010.
-
(2010)
Adv. Mater.
, vol.22
, Issue.47
, pp. 5332-5349
-
-
Frenzel, H.1
Lajn, A.2
Von Wenckstern, H.3
Lorenz, M.4
Schein, F.5
Zhang, Z.6
Grundmann, M.7
-
6
-
-
48249108407
-
P-channel thin-film transistor using p-type oxide semiconductor, SnO
-
Jul.
-
Y. Ogo, H. Hiramatsu, K. Nomura, H. Yanagi, T. Kamiya, M. Hirano, and H. Hosono, "p-channel thin-film transistor using p-type oxide semiconductor, SnO," Appl. Phys. Lett., vol. 93, no. 3, pp. 032113-1-032113-3, Jul. 2008.
-
(2008)
Appl. Phys. Lett.
, vol.93
, Issue.3
, pp. 0321131-0321133
-
-
Ogo, Y.1
Hiramatsu, H.2
Nomura, K.3
Yanagi, H.4
Kamiya, T.5
Hirano, M.6
Hosono, H.7
-
7
-
-
20644459026
-
Transparent thin-film transistors with zinc indium oxide channel layer
-
Mar.
-
N. L. Dehuff, E. S. Kettenring, D. Hong, H. Q. Chiang, J. F. Wager, R. L. Hoffman, C.-H. Park, and D. A. Keszler, "Transparent thin-film transistors with zinc indium oxide channel layer," J. Appl. Phys., vol. 97, no. 6, pp. 064505-1-064505-5, Mar. 2005.
-
(2005)
J. Appl. Phys.
, vol.97
, Issue.6
, pp. 0645051-0645055
-
-
Dehuff, N.L.1
Kettenring, E.S.2
Hong, D.3
Chiang, H.Q.4
Wager, J.F.5
Hoffman, R.L.6
Park, C.-H.7
Keszler, D.A.8
-
8
-
-
77952959792
-
Thinfilm transistors based on p-type Cu2O thin films produced at room temperature
-
May
-
E. Fortunato, V. Figueiredo, P. Barquinha, E. Elamurugu, R. Barros, G. Gonçalves, S.-H. K. Park, C.-S. Hwang, and R. Martins, "Thinfilm transistors based on p-type Cu2O thin films produced at room temperature," Appl. Phys. Lett., vol. 96, no. 19, pp. 192102-1-192102-3, May 2010.
-
(2010)
Appl. Phys. Lett.
, vol.96
, Issue.19
, pp. 1921021-1921023
-
-
Fortunato, E.1
Figueiredo, V.2
Barquinha, P.3
Elamurugu, E.4
Barros, R.5
Gonçalves, G.6
Park, S.-H.K.7
Hwang, C.-S.8
Martins, R.9
-
9
-
-
84860370389
-
ZnO-based n-channel junction field-effect transistor with roomtemperature-fabricated amorphous p-type ZnCo2O4 gate
-
May
-
F. Schein, H. von Wenckstern, H. Frenzel, and M. Grundmann, "ZnO-based n-channel junction field-effect transistor with roomtemperature-fabricated amorphous p-type ZnCo2O4 gate," IEEE Electron Device Lett., vol. 33, no. 5, pp. 676-678, May 2012.
-
(2012)
IEEE Electron Device Lett.
, vol.33
, Issue.5
, pp. 676-678
-
-
Schein, F.1
Von Wenckstern, H.2
Frenzel, H.3
Grundmann, M.4
-
10
-
-
82455212375
-
Tungsten oxide as a gate dielectric for highly transparent and temperature-stable zinc-oxide-based thin-film transistors
-
Dec.
-
M. Lorenz, H. von Wenckstern, and M. Grundmann, "Tungsten oxide as a gate dielectric for highly transparent and temperature-stable zinc-oxide-based thin-film transistors," Adv. Mater., vol. 23, no. 45, pp. 5383-5386, Dec. 2011.
-
(2011)
Adv. Mater.
, vol.23
, Issue.45
, pp. 5383-5386
-
-
Lorenz, M.1
Von Wenckstern, H.2
Grundmann, M.3
-
11
-
-
31144460426
-
Comparison of ZnO metal-oxide-semiconductor field effect transistor and metal-semiconductor field effect transistor structures grown on sapphire by pulsed laser deposition
-
DOI 10.1116/1.1924613
-
C. J. Kao, Y. W. Kwon, Y. W. Heo, D. P. Norton, S. J. Pearton, F. Ren, and G. C. Chi, "Comparison of ZnO metal-oxide-semiconductor field effect transistor and metal-semiconductor field effect transistor structures grown on sapphire by pulsed laser deposition," J. Vacuum Sci. Technol. B, vol. 23, no. 3, pp. 1024-1028, May 2005. (Pubitemid 43127309)
-
(2005)
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
, vol.23
, Issue.3
, pp. 1024-1028
-
-
Kao, C.J.1
Kwon, Y.W.2
Heo, Y.W.3
Norton, D.P.4
Pearton, S.J.5
Ren, F.6
Chi, G.C.7
-
12
-
-
36048966517
-
PLD of ZnO Films
-
K. Ellmer, A. Klein, and B. Rech, Eds. Berlin, Germany: Springer-Verlag
-
M. Lorenz, "PLD of ZnO Films," in Transparent Conductive Zinc Oxide. Basics and Applications in Thin Film Solar Cells (Springer Series in Material Science), K. Ellmer, A. Klein, and B. Rech, Eds. Berlin, Germany: Springer-Verlag, 2008, pp. 305-359.
-
(2008)
Transparent Conductive Zinc Oxide. Basics and Applications in Thin Film Solar Cells (Springer Series in Material Science)
, pp. 305-359
-
-
Lorenz, M.1
-
14
-
-
79955404294
-
Gate-and drain-lag effects in (Mg,Zn) O-based metalsemiconductor field-effect transistors
-
Apr.
-
F. J. Klüpfel, A. Lajn, H. Frenzel, H. von Wenckstern, and M. Grundmann, "Gate-and drain-lag effects in (Mg,Zn) O-based metalsemiconductor field-effect transistors," J. Appl. Phys., vol. 109, no. 7, pp. 074515-1-074515-4, Apr. 2011.
-
(2011)
J. Appl. Phys.
, vol.109
, Issue.7
, pp. 0745151-0745154
-
-
Klüpfel, F.J.1
Lajn, A.2
Frenzel, H.3
Von Wenckstern, H.4
Grundmann, M.5
-
15
-
-
77954255049
-
Transparent semiconducting oxides: Materials and devices
-
Jun.
-
M. Grundmann, H. Frenzel, A. Lajn, M. Lorenz, F. Schein, and H. von Wenckstern, "Transparent semiconducting oxides: Materials and devices," Phys. Status Solidi (a), vol. 207, no. 6, pp. 1437-1449, Jun. 2010.
-
(2010)
Phys. Status Solidi (A)
, vol.207
, Issue.6
, pp. 1437-1449
-
-
Grundmann, M.1
Frenzel, H.2
Lajn, A.3
Lorenz, M.4
Schein, F.5
Von Wenckstern, H.6
-
16
-
-
13644281226
-
Stability of hydrogenated amorphous silicon thin film transistors on polyimide substrates
-
DOI 10.1016/j.sse.2005.01.002, PII S0038110105000110
-
H. Kavak and H. Shanks, "Stability of hydrogenated amorphous silicon thin film transistors on polyimide substrates," Solid State Electron., vol. 49, no. 4, pp. 578-584, Apr. 2005. (Pubitemid 40231874)
-
(2005)
Solid-State Electronics
, vol.49
, Issue.4
, pp. 578-584
-
-
Kavak, H.1
Shanks, H.2
-
17
-
-
83455225823
-
Correlation between the stability and trap parameters of amorphous oxide thin film transistors
-
Mar.
-
E. Chong, K.-H. Park, E. A. Cho, J. Y. Choi, B. Kim, D.-Y. You, G.-E. Jang, and S. Y. Lee, "Correlation between the stability and trap parameters of amorphous oxide thin film transistors," Microelectron. Eng., vol. 91, pp. 50-53, Mar. 2012.
-
(2012)
Microelectron. Eng.
, vol.91
, pp. 50-53
-
-
Chong, E.1
Park, K.-H.2
Cho, E.A.3
Choi, J.Y.4
Kim, B.5
You, D.-Y.6
Jang, G.-E.7
Lee, S.Y.8
-
18
-
-
84862980313
-
Effect of reactive sputtered SiOx passivation layer on the stability of InGaZnO thin film transistors
-
Jul.
-
J. Li, F. Zhou, H.-P. Lin, W.-Q. Zhu, J.-H. Zhang, X.-Y. Jiang, and Z.-L. Zhang, "Effect of reactive sputtered SiOx passivation layer on the stability of InGaZnO thin film transistors," Vacuum, vol. 86, no. 12, pp. 1840-1843, Jul. 2012.
-
(2012)
Vacuum
, vol.86
, Issue.12
, pp. 1840-1843
-
-
Li, J.1
Zhou, F.2
Lin, H.-P.3
Zhu, W.-Q.4
Zhang, J.-H.5
Jiang, X.-Y.6
Zhang, Z.-L.7
-
19
-
-
64249170440
-
The effect of gate-bias stress and temperature on the performance of ZnO thin-film transistors
-
Jun.
-
R. Cross and M. De Souza, "The effect of gate-bias stress and temperature on the performance of ZnO thin-film transistors," IEEE Trans. Device Mater. Rel., vol. 8, no. 2, pp. 277-282, Jun. 2008.
-
(2008)
IEEE Trans. Device Mater. Rel.
, vol.8
, Issue.2
, pp. 277-282
-
-
Cross, R.1
De Souza, M.2
-
20
-
-
33847032591
-
Temperature dependent microwave performance of AlGaN/GaN high-electron-mobility transistors on high-resistivity silicon substrate
-
DOI 10.1016/j.tsf.2006.07.168, PII S0040609006009710, The Third International Conference on Materials for Advanced Technologies (ICMAT 2005) Symposium J - III- V Semiconductors for Microelectronic and Optoelectronic Applications ICMAT 2005
-
S. Arulkumaran, Z. Liu, G. Ng, W. Cheong, R. Zeng, J. Bu, H. Wang, K. Radhakrishnan, and C. Tan, "Temperature dependent microwave performance of AlGaN/GaN high-electron-mobility transistors on highresistivity silicon substrate," Thin Solid Films, vol. 515, no. 10, pp. 4517-4521, Mar. 2007. (Pubitemid 46274861)
-
(2007)
Thin Solid Films
, vol.515
, Issue.10
, pp. 4517-4521
-
-
Arulkumaran, S.1
Liu, Z.H.2
Ng, G.I.3
Cheong, W.C.4
Zeng, R.5
Bu, J.6
Wang, H.7
Radhakrishnan, K.8
Tan, C.L.9
-
21
-
-
70350081241
-
Properties of reactively sputtered Ag, Au, Pd, and Pt Schottky contacts on n-type ZnO
-
May
-
A. Lajn, H. von Wenckstern, Z. Zhang, C. Czekalla, G. Biehne, J. Lenzner, H. Hochmuth, M. Lorenz, M. Grundmann, S. Wickert, C. Vogt, and R. Denecke, "Properties of reactively sputtered Ag, Au, Pd, and Pt Schottky contacts on n-type ZnO," J. Vacuum Sci. Technol. B, vol. 27, no. 3, pp. 1769-1773, May 2009.
-
(2009)
J. Vacuum Sci. Technol. B
, vol.27
, Issue.3
, pp. 1769-1773
-
-
Lajn, A.1
Von Wenckstern, H.2
Zhang, Z.3
Czekalla, C.4
Biehne, G.5
Lenzner, J.6
Hochmuth, H.7
Lorenz, M.8
Grundmann, M.9
Wickert, S.10
Vogt, C.11
Denecke, R.12
-
22
-
-
0018517266
-
Subthreshold behavior of uniformly and nonuniformly doped long-channel mosfet
-
J. Brews, "Subthreshold behavior of uniformly and nonuniformly doped long-channel MOSFET," IEEE Trans. Electron Devices, vol. 26, no. 9, pp. 1282-1291, Sep. 1979. (Pubitemid 10418121)
-
(1979)
IEEE Transactions on Electron Devices
, vol.ED-26
, Issue.9
, pp. 1282-1291
-
-
Brews John, R.1
-
23
-
-
0026108160
-
A diffusion model of subthreshold current for GaAs mesfets
-
Feb.
-
C. Liang, N. Cheung, R. Sato, M. Sokolich, and N. Doudoumopoulos, "A diffusion model of subthreshold current for GaAs mesfets," Solid-State Electron., vol. 34, no. 2, pp. 131-138, Feb. 1991.
-
(1991)
Solid-State Electron.
, vol.34
, Issue.2
, pp. 131-138
-
-
Liang, C.1
Cheung, N.2
Sato, R.3
Sokolich, M.4
Doudoumopoulos, N.5
-
24
-
-
0027735508
-
Electrical properties of amorphous silicon transistors and MISdevices: Comparative study of top nitride and bottom nitride configurations
-
Dec.
-
A. Rolland, J. Richard, J. P. Kleider, and D. Mencaraglia, "Electrical properties of amorphous silicon transistors and MISdevices: Comparative study of top nitride and bottom nitride configurations," J. Electrochem. Soc., vol. 140, no. 12, pp. 3679-3683, Dec. 1993.
-
(1993)
J. Electrochem. Soc.
, vol.140
, Issue.12
, pp. 3679-3683
-
-
Rolland, A.1
Richard, J.2
Kleider, J.P.3
Mencaraglia, D.4
-
25
-
-
69249177220
-
High performance ZnO-thin-film transistor with Ta2O5 dielectrics fabricated at room temperature
-
Aug.
-
L. Zhang, J. Li, X. W. Zhang, X. Y. Jiang, and Z. L. Zhang, "High performance ZnO-thin-film transistor with Ta2O5 dielectrics fabricated at room temperature," Appl. Phys. Lett., vol. 95, no. 7, pp. 072112-1-072112-3, Aug. 2009.
-
(2009)
Appl. Phys. Lett.
, vol.95
, Issue.7
, pp. 0721121-0721123
-
-
Zhang, L.1
Li, J.2
Zhang, X.W.3
Jiang, X.Y.4
Zhang, Z.L.5
|