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Volumn 60, Issue 6, 2013, Pages 1828-1833

Comparison of ZnO-based JFET, MESFET, and MISFET

Author keywords

Junction field effect transistors (JFETs); metal insulator semiconductor field effect transistors (MISFETs); metal semiconductor field effect transistors (MESFETs); zinc oxide (ZnO)

Indexed keywords

DC CHARACTERISTICS; DEVICE CHARACTERISTICS; FREQUENCY DEPENDENCE; JUNCTION FIELD-EFFECT TRANSISTORS (JFETS); METAL SEMICONDUCTORS; METAL-INSULATOR-SEMICONDUCTOR FIELD-EFFECT TRANSISTORS; ROOM TEMPERATURE; ZINC OXIDE (ZNO);

EID: 84878161109     PISSN: 00189383     EISSN: None     Source Type: Journal    
DOI: 10.1109/TED.2013.2257173     Document Type: Article
Times cited : (23)

References (25)
  • 2
    • 9744248669 scopus 로고    scopus 로고
    • Room-temperature fabrication of transparent flexible thin-film transistors using amorphous oxide semiconductors
    • DOI 10.1038/nature03090
    • K. Nomura, H. Ohta, A. Takagi, T. Kamiya, M. Hirano, and H. Hosono, "Room-temperature fabrication of transparent flexible thin-film transistors using amorphous oxide semiconductors," Nature, vol. 432, no. 7016, pp. 488-492, Nov. 2004. (Pubitemid 39585210)
    • (2004) Nature , vol.432 , Issue.7016 , pp. 488-492
    • Nomura, K.1    Ohta, H.2    Takagi, A.3    Kamiya, T.4    Hirano, M.5    Hosono, H.6
  • 3
    • 78149382528 scopus 로고    scopus 로고
    • Present status of amorphous In-Ga-Zn-O thin-film transistors
    • Aug.
    • T. Kamiya, K. Nomura, and H. Hosono, "Present status of amorphous In-Ga-Zn-O thin-film transistors," Sci. Technol. Adv. Mater., vol. 11, no. 4, p. 044305, Aug. 2010.
    • (2010) Sci. Technol. Adv. Mater. , vol.11 , Issue.4 , pp. 044305
    • Kamiya, T.1    Nomura, K.2    Hosono, H.3
  • 4
    • 22944469098 scopus 로고    scopus 로고
    • Recent advances in ZnO transparent thin film transistors
    • DOI 10.1016/j.tsf.2005.01.066, PII S0040609005000957, International Conference on Polycrystalline Semiconductors-Materials, Technologies, Device Applications
    • E. Fortunato, P. Barquinha, A. Pimentel, A. Gonçalves, A. Marques, L. Pereira, and R. Martins, "Recent advances in ZnO transparent thin film transistors," Thin Solid Films, vol. 487, nos. 1-2, pp. 205-211, Mar. 2005. (Pubitemid 41046321)
    • (2005) Thin Solid Films , vol.487 , Issue.1-2 , pp. 205-211
    • Fortunato, E.1    Barquinha, P.2    Pimentel, A.3    Goncalves, A.4    Marques, A.5    Pereira, L.6    Martins, R.7
  • 5
    • 78650292845 scopus 로고    scopus 로고
    • Recent progress on ZnO-based metalsemiconductor field-effect transistors and their application in transparent integrated circuits
    • Dec.
    • H. Frenzel, A. Lajn, H. von Wenckstern, M. Lorenz, F. Schein, Z. Zhang, and M. Grundmann, "Recent progress on ZnO-based metalsemiconductor field-effect transistors and their application in transparent integrated circuits," Adv. Mater., vol. 22, no. 47, pp. 5332-5349, Dec. 2010.
    • (2010) Adv. Mater. , vol.22 , Issue.47 , pp. 5332-5349
    • Frenzel, H.1    Lajn, A.2    Von Wenckstern, H.3    Lorenz, M.4    Schein, F.5    Zhang, Z.6    Grundmann, M.7
  • 6
    • 48249108407 scopus 로고    scopus 로고
    • P-channel thin-film transistor using p-type oxide semiconductor, SnO
    • Jul.
    • Y. Ogo, H. Hiramatsu, K. Nomura, H. Yanagi, T. Kamiya, M. Hirano, and H. Hosono, "p-channel thin-film transistor using p-type oxide semiconductor, SnO," Appl. Phys. Lett., vol. 93, no. 3, pp. 032113-1-032113-3, Jul. 2008.
    • (2008) Appl. Phys. Lett. , vol.93 , Issue.3 , pp. 0321131-0321133
    • Ogo, Y.1    Hiramatsu, H.2    Nomura, K.3    Yanagi, H.4    Kamiya, T.5    Hirano, M.6    Hosono, H.7
  • 9
    • 84860370389 scopus 로고    scopus 로고
    • ZnO-based n-channel junction field-effect transistor with roomtemperature-fabricated amorphous p-type ZnCo2O4 gate
    • May
    • F. Schein, H. von Wenckstern, H. Frenzel, and M. Grundmann, "ZnO-based n-channel junction field-effect transistor with roomtemperature-fabricated amorphous p-type ZnCo2O4 gate," IEEE Electron Device Lett., vol. 33, no. 5, pp. 676-678, May 2012.
    • (2012) IEEE Electron Device Lett. , vol.33 , Issue.5 , pp. 676-678
    • Schein, F.1    Von Wenckstern, H.2    Frenzel, H.3    Grundmann, M.4
  • 10
    • 82455212375 scopus 로고    scopus 로고
    • Tungsten oxide as a gate dielectric for highly transparent and temperature-stable zinc-oxide-based thin-film transistors
    • Dec.
    • M. Lorenz, H. von Wenckstern, and M. Grundmann, "Tungsten oxide as a gate dielectric for highly transparent and temperature-stable zinc-oxide-based thin-film transistors," Adv. Mater., vol. 23, no. 45, pp. 5383-5386, Dec. 2011.
    • (2011) Adv. Mater. , vol.23 , Issue.45 , pp. 5383-5386
    • Lorenz, M.1    Von Wenckstern, H.2    Grundmann, M.3
  • 14
    • 79955404294 scopus 로고    scopus 로고
    • Gate-and drain-lag effects in (Mg,Zn) O-based metalsemiconductor field-effect transistors
    • Apr.
    • F. J. Klüpfel, A. Lajn, H. Frenzel, H. von Wenckstern, and M. Grundmann, "Gate-and drain-lag effects in (Mg,Zn) O-based metalsemiconductor field-effect transistors," J. Appl. Phys., vol. 109, no. 7, pp. 074515-1-074515-4, Apr. 2011.
    • (2011) J. Appl. Phys. , vol.109 , Issue.7 , pp. 0745151-0745154
    • Klüpfel, F.J.1    Lajn, A.2    Frenzel, H.3    Von Wenckstern, H.4    Grundmann, M.5
  • 16
    • 13644281226 scopus 로고    scopus 로고
    • Stability of hydrogenated amorphous silicon thin film transistors on polyimide substrates
    • DOI 10.1016/j.sse.2005.01.002, PII S0038110105000110
    • H. Kavak and H. Shanks, "Stability of hydrogenated amorphous silicon thin film transistors on polyimide substrates," Solid State Electron., vol. 49, no. 4, pp. 578-584, Apr. 2005. (Pubitemid 40231874)
    • (2005) Solid-State Electronics , vol.49 , Issue.4 , pp. 578-584
    • Kavak, H.1    Shanks, H.2
  • 17
    • 83455225823 scopus 로고    scopus 로고
    • Correlation between the stability and trap parameters of amorphous oxide thin film transistors
    • Mar.
    • E. Chong, K.-H. Park, E. A. Cho, J. Y. Choi, B. Kim, D.-Y. You, G.-E. Jang, and S. Y. Lee, "Correlation between the stability and trap parameters of amorphous oxide thin film transistors," Microelectron. Eng., vol. 91, pp. 50-53, Mar. 2012.
    • (2012) Microelectron. Eng. , vol.91 , pp. 50-53
    • Chong, E.1    Park, K.-H.2    Cho, E.A.3    Choi, J.Y.4    Kim, B.5    You, D.-Y.6    Jang, G.-E.7    Lee, S.Y.8
  • 18
    • 84862980313 scopus 로고    scopus 로고
    • Effect of reactive sputtered SiOx passivation layer on the stability of InGaZnO thin film transistors
    • Jul.
    • J. Li, F. Zhou, H.-P. Lin, W.-Q. Zhu, J.-H. Zhang, X.-Y. Jiang, and Z.-L. Zhang, "Effect of reactive sputtered SiOx passivation layer on the stability of InGaZnO thin film transistors," Vacuum, vol. 86, no. 12, pp. 1840-1843, Jul. 2012.
    • (2012) Vacuum , vol.86 , Issue.12 , pp. 1840-1843
    • Li, J.1    Zhou, F.2    Lin, H.-P.3    Zhu, W.-Q.4    Zhang, J.-H.5    Jiang, X.-Y.6    Zhang, Z.-L.7
  • 19
    • 64249170440 scopus 로고    scopus 로고
    • The effect of gate-bias stress and temperature on the performance of ZnO thin-film transistors
    • Jun.
    • R. Cross and M. De Souza, "The effect of gate-bias stress and temperature on the performance of ZnO thin-film transistors," IEEE Trans. Device Mater. Rel., vol. 8, no. 2, pp. 277-282, Jun. 2008.
    • (2008) IEEE Trans. Device Mater. Rel. , vol.8 , Issue.2 , pp. 277-282
    • Cross, R.1    De Souza, M.2
  • 20
    • 33847032591 scopus 로고    scopus 로고
    • Temperature dependent microwave performance of AlGaN/GaN high-electron-mobility transistors on high-resistivity silicon substrate
    • DOI 10.1016/j.tsf.2006.07.168, PII S0040609006009710, The Third International Conference on Materials for Advanced Technologies (ICMAT 2005) Symposium J - III- V Semiconductors for Microelectronic and Optoelectronic Applications ICMAT 2005
    • S. Arulkumaran, Z. Liu, G. Ng, W. Cheong, R. Zeng, J. Bu, H. Wang, K. Radhakrishnan, and C. Tan, "Temperature dependent microwave performance of AlGaN/GaN high-electron-mobility transistors on highresistivity silicon substrate," Thin Solid Films, vol. 515, no. 10, pp. 4517-4521, Mar. 2007. (Pubitemid 46274861)
    • (2007) Thin Solid Films , vol.515 , Issue.10 , pp. 4517-4521
    • Arulkumaran, S.1    Liu, Z.H.2    Ng, G.I.3    Cheong, W.C.4    Zeng, R.5    Bu, J.6    Wang, H.7    Radhakrishnan, K.8    Tan, C.L.9
  • 22
    • 0018517266 scopus 로고
    • Subthreshold behavior of uniformly and nonuniformly doped long-channel mosfet
    • J. Brews, "Subthreshold behavior of uniformly and nonuniformly doped long-channel MOSFET," IEEE Trans. Electron Devices, vol. 26, no. 9, pp. 1282-1291, Sep. 1979. (Pubitemid 10418121)
    • (1979) IEEE Transactions on Electron Devices , vol.ED-26 , Issue.9 , pp. 1282-1291
    • Brews John, R.1
  • 24
    • 0027735508 scopus 로고
    • Electrical properties of amorphous silicon transistors and MISdevices: Comparative study of top nitride and bottom nitride configurations
    • Dec.
    • A. Rolland, J. Richard, J. P. Kleider, and D. Mencaraglia, "Electrical properties of amorphous silicon transistors and MISdevices: Comparative study of top nitride and bottom nitride configurations," J. Electrochem. Soc., vol. 140, no. 12, pp. 3679-3683, Dec. 1993.
    • (1993) J. Electrochem. Soc. , vol.140 , Issue.12 , pp. 3679-3683
    • Rolland, A.1    Richard, J.2    Kleider, J.P.3    Mencaraglia, D.4
  • 25
    • 69249177220 scopus 로고    scopus 로고
    • High performance ZnO-thin-film transistor with Ta2O5 dielectrics fabricated at room temperature
    • Aug.
    • L. Zhang, J. Li, X. W. Zhang, X. Y. Jiang, and Z. L. Zhang, "High performance ZnO-thin-film transistor with Ta2O5 dielectrics fabricated at room temperature," Appl. Phys. Lett., vol. 95, no. 7, pp. 072112-1-072112-3, Aug. 2009.
    • (2009) Appl. Phys. Lett. , vol.95 , Issue.7 , pp. 0721121-0721123
    • Zhang, L.1    Li, J.2    Zhang, X.W.3    Jiang, X.Y.4    Zhang, Z.L.5


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.