Optimization of microstructure and optical properties of VO2 thin film prepared by reactive sputtering

Journal of Applied Physics

Volumn 113, Issue 18, 2013, Pages

  Luo, Y Y ^a   Zhu, L Q ^b   Zhang, Y X ^a   Pan, S S ^a   Xu, S C ^a   Liu, M ^a   Li, G H ^a  

^a INSTITUTE OF SOLID STATE PHYSICS   (China)

^b NINGBO INSTITUTE OF MATERIALS TECHNOLOGY AND ENGINEERING   (China)

Author keywords

[No Author keywords available]

Indexed keywords

AS-GROWN; HYSTERESIS WIDTHS; METAL STATE; OPTICAL SWITCHING; REACTIVE SPUTTERING METHOD; SPUTTERING GAS PRESSURE; SPUTTERING PARAMETERS; STRUCTURAL AND OPTICAL PROPERTIES;

MICROSTRUCTURE; OPTICAL SWITCHES; REFRACTIVE INDEX;

THIN FILMS;

EID: 84878054683     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4803840     Document Type: Article

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