Comparison of the optical responses of O-poor and O-rich thermochromic VO X films during semiconductor-to-metal transition

Journal of Physics and Chemistry of Solids

Volumn 73, Issue 9, 2012, Pages 1122-1126

  Luo, Zhenfei ^a   Wu, Zhiming ^a   Wang, Tao ^a   Xu, Xiangdong ^a   Li, Weizhi ^a   Li, Wei ^a   Jiang, Yadong ^a  

^a UNIVERSITY OF ELECTRONIC SCIENCE AND TECHNOLOGY OF CHINA   (China)

Author keywords

A. Thin films; D. Optical properties

Indexed keywords

CONSISTENT VARIATION; DIRECT CURRENT MAGNETRON SPUTTERING; EXTINCTION COEFFICIENTS; NANOSTRUCTURED THIN FILM; OPTICAL BEHAVIOR; OPTICAL RESPONSE; OXYGEN AMBIENT; POST ANNEALING; SEMICONDUCTOR-TO-METAL TRANSITIONS; THERMO-CHROMIC; TRANSMISSION VALUE; UV-VISIBLE SPECTROPHOTOMETER; VANADIUM OXIDES; VISIBLE REGION;

OPTICAL CONDUCTIVITY; SPECTROSCOPIC ELLIPSOMETRY; VANADIUM COMPOUNDS;

THIN FILMS;

EID: 84862516808     PISSN: 00223697     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jpcs.2012.04.020     Document Type: Article

References (18)

1. M. Ibisate, D. Golmayo, and C. López Vanadium dioxide thermochromic opals grown by chemical vapour deposition J. Opt. A: Pure Appl. Opt. 10 2008 125202/1 6
2. H. Kakiuchida, P. Jin, and M. Tazawa Control of thermochromic spectrum in vanadium dioxide by amorphous silicon suboxide layer Sol. Energy Mater. Sol. Cells 92 2008 1279 1284
3. 2 in the metal phase: a plasmonic system with falling dc resistivity as temperature rises Nanotechnology 18 2007 025202/1 7
4. T. Driscoll, H.T. Kim, B.G. Chae, B.J. Kim, Y.W. Lee, N.M. Jokerst, S. Palit, D.R. Smith, M.D. Ventra, and D.N. Basov Memory metamaterials Science 325 2009 1518 1521
5. 2 and the influence of the composition on the physical properties. II. The change of the physical properties in the range of homogeneity Phys. Status Solidi A 29 1975 63 70
6. C.H. Griffiths, and H.K. Eastwood Influence of stoichiometry on the metal-semiconductor transition in vanadium dioxide J. Appl. Phys. 45 1974 2201 2206
7. 3-coated Si substrates by reactive rf-magnetron sputter deposition Jpn. J. Appl. Phys. 47 2008 3067 3069
8. 2 films by reactive RF sputtering J. Phys. D: Appl. Phys. 39 2006 2220 2223
9. F.Y. Gan, and P. Laou Optical and electrical properties of sputtered vanadium oxide films J. Vac. Sci. Technol. A 22 2004 879 882
10. X thin films prepared by direct current magnetron reactive sputtering and post-annealing in oxygen Thin Solid Films 519 2011 6203 6207
11. M. Demeter, M. Neumann, and W. Reichelt Mixed-valence vanadium oxides studied by XPS Surf. Sci. 454-456 2000 41 44
12. E. Cazzanelli, G. Mariotto, S. Passerini, W.H. Smyrl, and A. Gorenstein Raman and XPS characterization of vanadium oxide thin films deposited by reactive RF sputtering Sol. Energy Mater. Sol. Cells 56 1999 249 258
13. V. Bondarenka, S. Grebinskij, S. Kaciulis, G. Mattogno, S. Mickevicius, H. Tvardauskas, V. Volkov, and G. Zakharov XPS study of vanadium-yttrium hydrates J. Electron Spectrosc. Relat. Phenom. 120 2001 131 135
14. 3 Mater. Chem. Phys. 50 1997 267 270
15. 3(x≤0.3) J. Phys.: Condens. Matter 4 1992 7377 7388
16. M.M. Qazilbash, K.S. Burch, D. Whisler, D. Shrekenhamer, B.G. Chae, H.T. Kim, and D.N. Basov Correlated metallic state of vanadium dioxide Phys. Rev. B 74 2006 205118/1 5
17. 2 Phys. Rev. B 73 2006 165116/1 5
18. W.B. Jackson, S.M. Kelso, C.C. Tsai, J.W. Allen, and S.-J. Oh Energy dependence of the optical matrix element in hydrogenated amorphous and crystalline silicon Phys. Rev. B 31 1985 5187 5198