-
3
-
-
30344434987
-
-
S. Chen, H. Ma, S. Wang, N. Shen, J. Xiao, H. Zhou, X. Zhao, Y. Li, and X. Yi Thin Solid Films 497 2006 267 269
-
(2006)
Thin Solid Films
, vol.497
, pp. 267-269
-
-
Chen, S.1
Ma, H.2
Wang, S.3
Shen, N.4
Xiao, J.5
Zhou, H.6
Zhao, X.7
Li, Y.8
Yi, X.9
-
6
-
-
0017929211
-
-
K.I. Zemskov, M.A. Kazaryan, V.G. Mokerov, G.G. Petrash, and A.G. Petrova Sov. J. Quant. Electron. 8 1978 245 247
-
(1978)
Sov. J. Quant. Electron.
, vol.8
, pp. 245-247
-
-
Zemskov, K.I.1
Kazaryan, M.A.2
Mokerov, V.G.3
Petrash, G.G.4
Petrova, A.G.5
-
7
-
-
43349083081
-
-
M. Rini, Z. Hao, R.W. Schoenlein, C. Giannetti, F. Parmigiani, S. Fourmaux, J.C. Kieffer, A. Fujimori, M. Onoda, S. Wall, and A. Cavalleri Appl. Phys. Lett. 92 2008 181904
-
(2008)
Appl. Phys. Lett.
, vol.92
, pp. 181904
-
-
Rini, M.1
Hao, Z.2
Schoenlein, R.W.3
Giannetti, C.4
Parmigiani, F.5
Fourmaux, S.6
Kieffer, J.C.7
Fujimori, A.8
Onoda, M.9
Wall, S.10
Cavalleri, A.11
-
8
-
-
77954321285
-
-
W.X. Huang, X.G. Yin, C.P. Huang, Q.J. Wang, T.F. Miao, and Y.Y. Zhu Appl. Phys. Lett. 96 2010 261908
-
(2010)
Appl. Phys. Lett.
, vol.96
, pp. 261908
-
-
Huang, W.X.1
Yin, X.G.2
Huang, C.P.3
Wang, Q.J.4
Miao, T.F.5
Zhu, Y.Y.6
-
9
-
-
33646773194
-
-
H.M. Liu, A. Rua, O. Vasquez, V.S. Vikhnin, F.E. Fernandez, L.F. Fonseca, O. Resto, and S.Z. Weisz Sensors 5 2005 185 198
-
(2005)
Sensors
, vol.5
, pp. 185-198
-
-
Liu, H.M.1
Rua, A.2
Vasquez, O.3
Vikhnin, V.S.4
Fernandez, F.E.5
Fonseca, L.F.6
Resto, O.7
Weisz, S.Z.8
-
12
-
-
1242297695
-
-
T.D. Manning, I.P. Parkin, M.E. Pemble, D. Sheel, and D. Vernardou Chem. Mater. 16 2004 744 749
-
(2004)
Chem. Mater.
, vol.16
, pp. 744-749
-
-
Manning, T.D.1
Parkin, I.P.2
Pemble, M.E.3
Sheel, D.4
Vernardou, D.5
-
16
-
-
4544280148
-
-
R. Lopez, L.A. Boatner, T.E. Haynes, J.R.F. Haglund, and L.C. Feldman Appl. Phys. Lett. 85 2004 1410 1412
-
(2004)
Appl. Phys. Lett.
, vol.85
, pp. 1410-1412
-
-
Lopez, R.1
Boatner, L.A.2
Haynes, T.E.3
Haglund, J.R.F.4
Feldman, L.C.5
-
17
-
-
0036612529
-
-
R. Lopez, T.E. Haynes, L.A. Boatner, L.C. Feldman, and R.F. Haglund Phys. Rev. B 65 2002 224113
-
(2002)
Phys. Rev. B
, vol.65
, pp. 224113
-
-
Lopez, R.1
Haynes, T.E.2
Boatner, L.A.3
Feldman, L.C.4
Haglund, R.F.5
-
19
-
-
2442673933
-
-
C.L. Xu, L. Ma, X. Liu, W.Y. Qiu, and Z.X. Su Mater. Res. Bull. 39 2004 881 886
-
(2004)
Mater. Res. Bull.
, vol.39
, pp. 881-886
-
-
Xu, C.L.1
Ma, L.2
Liu, X.3
Qiu, W.Y.4
Su, Z.X.5
-
23
-
-
77957892812
-
-
A. Pan, J.-G. Zhang, Z. Nie, G. Cao, B.-W. Arey, G. Li, S.-Q. Liang, and J. Liu J. Mater. Chem. 20 41 2010 9193 9199
-
(2010)
J. Mater. Chem.
, vol.20
, Issue.41
, pp. 9193-9199
-
-
Pan, A.1
Zhang, J.-G.2
Nie, Z.3
Cao, G.4
Arey, B.-W.5
Li, G.6
Liang, S.-Q.7
Liu, J.8
-
24
-
-
4544325413
-
-
B. Tang, J.C. Ge, C.G. Wu, L.H. Zhuo, J.Y. Niu, Z.Z. Chen, Z.Q. Shi, and Y.B. Dong Nanotechnology 15 2004 1273 1276
-
(2004)
Nanotechnology
, vol.15
, pp. 1273-1276
-
-
Tang, B.1
Ge, J.C.2
Wu, C.G.3
Zhuo, L.H.4
Niu, J.Y.5
Chen, Z.Z.6
Shi, Z.Q.7
Dong, Y.B.8
-
25
-
-
0007944388
-
-
C. Tang, P. Georgopoulos, M.E. Fine, J.B. Cohen, M. Nygren, G.S. Knapp, and A. Aldred Phys. Rev. B 31 1985 1000 1011
-
(1985)
Phys. Rev. B
, vol.31
, pp. 1000-1011
-
-
Tang, C.1
Georgopoulos, P.2
Fine, M.E.3
Cohen, J.B.4
Nygren, M.5
Knapp, G.S.6
Aldred, A.7
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