Annealing effects on VO2 thin films deposited by reactive sputtering

Thin Solid Films

Volumn 515, Issue 4, 2006, Pages 2519-2522

  Fu, Ganhua ^a   Polity, Angelika ^a   Volbers, Niklas ^a   Meyer, Bruno K ^a  

^a JUSTUS LIEBIG UNIVERSITY   (Germany)

Author keywords

Heat treatment; Optical properties; Sputtering; Vanadium oxide

Indexed keywords

ANNEALING; INTERDIFFUSION (SOLIDS); OPTICAL SWITCHES; SPUTTERING; THERMODYNAMIC STABILITY; VANADIUM COMPOUNDS;

CAPPING LAYER; FLOAT GLASS; REACTIVE SPUTTERING; SEMICONDUCTOR-TO-METAL TRANSITION;

THIN FILMS;

EID: 33750827050     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.04.025     Document Type: Article

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