메뉴 건너뛰기




Volumn 95, Issue 3, 2004, Pages 1407-1411

Growth optimization and electrical characteristics of VO2 films on amorphous SiO2/Si substrates

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; CURRENT VOLTAGE CHARACTERISTICS; ELECTRIC CONDUCTIVITY OF SOLIDS; ELECTRON DEVICE MANUFACTURE; FILM GROWTH; LATTICE CONSTANTS; METAL INSULATOR TRANSITION; OPTIMIZATION; PULSED LASER DEPOSITION; TRANSMISSION ELECTRON MICROSCOPY; VANADIUM COMPOUNDS; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 1142292365     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1637935     Document Type: Article
Times cited : (46)

References (15)
  • 2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.