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Applied Physics Letters

Volumn 102, Issue 19, 2013, Pages

Optimization of graphene dry etching conditions via combined microscopic and spectroscopic analysis

(4) Prado, Mariana C a Jariwala, Deep b Marks, Tobin J b,c Hersam, Mark C b,c

a FEDERAL UNIVERSITY OF MINAS GERAIS (Brazil)

b Northwestern University (United States)

c NORTHWESTERN UNIVERSITY (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AFM; DELETERIOUS EFFECTS; DOWNSTREAM-PROCESSING; ETCHING CONDITION; SINGLE LAYER;

ATOMIC FORCE MICROSCOPY; BYPRODUCTS; DRY ETCHING; OPTICAL MICROSCOPY; OPTIMIZATION; PLASMA ETCHING; RAMAN SPECTROSCOPY; SPECTROSCOPIC ANALYSIS;

GRAPHENE;

EID: 84877955221 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.4807425 Document Type: Article

Times cited : (35)

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