Plasma oxidation of thermally grown graphenes and their characterization

Vacuum

Volumn 87, Issue , 2013, Pages 200-204

  Lee, Byeong Joo ^a   Jeong, Goo Hwan ^a  

^a Kangwon National University   (South Korea)

Author keywords

Atomic force microscopy; DC plasma; Graphene; Plasma oxidation; Raman spectroscopy; Structural modification

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHARACTERIZATION; CHEMICAL VAPOR DEPOSITION; OXIDATION; PLASMA APPLICATIONS; RAMAN SPECTROSCOPY;

AIR-PLASMA TREATMENT; DC PLASMA; NUMBER OF LAYERS; PLASMA OXIDATION; PROPERTY CHARACTERIZATIONS; STRUCTURAL MODIFICATIONS; SUBSTRATE EFFECTS; THERMAL CHEMICAL VAPOR DEPOSITION;

GRAPHENE;

EID: 84948081893     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2012.02.022     Document Type: Article

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