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The microscope was manufactured by the Japanese Electro-Optics Laboratory. We have significantly modified the sample bias voltage circuitry and the sample holder to allow three independent biasing electrodes for our measurement.
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Noncontact mode AFM was performed using NSC 15 Rectangular cantilever (325 kHz, 40 N/m) from MicroMasch.
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For this control experiment, we tested both poly(methyl methacrylate) (PMMA) and copolymer PMMA/8.5% methacrylic acid (MMA-MAA) resists in contact with the substrate. Both resists show similar resist residues upon lift-off.
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For this control experiment, we tested both poly(methyl methacrylate) (PMMA) and copolymer PMMA/8.5% methacrylic acid (MMA-MAA) resists in contact with the substrate. Both resists show similar resist residues upon lift-off.
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N-Methyl-2-pyrrolidone (NMP)-based remover sold by Microchem.
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2 flow must be maintained throughout the heating and annealing. Otherwise, the residue film is not removed.
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For each correlation function, we average seven different horizontal line profiles acquired on each respective surface. Constant linear offsets at large distances from 50 to 150 nm have been subtracted to account for imperfect plane tilt correction performed on the image.
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For each correlation function, we average seven different horizontal line profiles acquired on each respective surface. Constant linear offsets at large distances from 50 to 150 nm have been subtracted to account for imperfect plane tilt correction performed on the image.
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In the first electron-beam lithography (EBL) step, alignment markers are defined using EBL near the monolayer materials. Electronic contacts are then defined in the second EBL step using the alignment markers. The contacts are gold with chromium sticking layer. Typically, PMMA/MMA-MAA bilayer resist is used for EBL
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In the first electron-beam lithography (EBL) step, alignment markers are defined using EBL near the monolayer materials. Electronic contacts are then defined in the second EBL step using the alignment markers. The contacts are gold with chromium sticking layer. Typically, PMMA/MMA-MAA bilayer resist is used for EBL.
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