A universal scheme for patterning of oxides via thermal nanoimprint lithography

Advanced Functional Materials

Volumn 23, Issue 17, 2013, Pages 2201-2211

  Dinachali, Saman Safari ^a   Saifullah, Mohammad S M ^a,b   Ganesan, Ramakrishnan ^c   Thian, Eng San ^b   He, Chaobin ^a,b  

^a INSTITUTE OF MATERIALS RESEARCH AND ENGINEERING   (Singapore)

^b NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

^c BIRLA INSTITUTE OF TECHNOLOGY AND SCIENCE   (India)

Author keywords

alkoxides; nanoimprint lithography; oxides; patterning

Indexed keywords

ALKOXIDES; DIRECT-PATTERNING; HIGH SURFACE ENERGY; LOW SURFACE ENERGY; METHACRYLATE GROUPS; PATTERNING; SITU COPOLYMERIZATION; THERMAL NANO-IMPRINT LITHOGRAPHIES;

CHELATION; HAFNIUM OXIDES; INTERFACIAL ENERGY; NIOBIUM OXIDE; OXIDES; SOL-GEL PROCESS; SOL-GELS; TANTALUM OXIDES;

NANOIMPRINT LITHOGRAPHY;

EID: 84877261486     PISSN: 1616301X     EISSN: 16163028     Source Type: Journal    
DOI: 10.1002/adfm.201202577     Document Type: Article

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