Formation of polycrystalline BaSi2 films by radio-frequency magnetron sputtering for thin-film solar cell applications

Thin Solid Films

Volumn 534, Issue , 2013, Pages 116-119

  Yoneyama, Takahiro ^a   Okada, Atsushi ^a   Suzuno, Mitsushi ^a   Shibutami, Tetsuo ^b   Matsumaru, Keitaro ^b   Saito, Noriyuki ^c   Yoshizawa, Noriko ^c   Toko, Kaoru ^a   Suemasu, Takashi ^a,d  

^a UNIVERSITY OF TSUKUBA   (Japan)

^b TOSOH CORPORATION   (Japan)

^c NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^d JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

Barium silicide; Photoresponse; Solar cells; Sputtering; Transmission electron microscopy; X ray diffraction

Indexed keywords

AL ELECTRODE; PHOTON ENERGY; PHOTORESPONSES; PHOTORESPONSIVITY; POLYCRYSTALLINE; POST ANNEALING; RADIO-FREQUENCY-MAGNETRON SPUTTERING; THIN-FILM SOLAR CELLS;

BIAS VOLTAGE; MAGNETRON SPUTTERING; SILICIDES; SPUTTERING; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION;

SOLAR CELLS;

EID: 84876695091     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2013.02.003     Document Type: Article

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