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Volumn 178, Issue 9, 2013, Pages 686-690

Radial junctions formed by conformal chemical doping for innovative hole-based solar cells

Author keywords

Chemical doping; Conformal doping; Radial junctions; Solar cells

Indexed keywords

ENERGY GAP; QUANTUM ELECTRONICS; SILICON SOLAR CELLS;

EID: 84876417225     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mseb.2012.11.019     Document Type: Article
Times cited : (14)

References (37)
  • 35
    • 0003950677 scopus 로고    scopus 로고
    • US Patent No. 5,501,893, filed 5 August 1994, issued 26 March 1996, Licensed from Robert Bosch GmbH
    • F. Lärmer, A. Schlip, A method of anisotropically etching silicon, US Patent No. 5,501,893, filed 5 August 1994, issued 26 March 1996, Licensed from Robert Bosch GmbH.
    • A Method of Anisotropically Etching Silicon
    • Lärmer, F.1    Schlip, A.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.