Synthesis of silicon nanowires with wurtzite crystalline structure by using standard chemical vapor deposition

Advanced Materials

Volumn 19, Issue 10, 2007, Pages 1347-1351

  Fontcuberta I Morral, Anna ^a   Arbiol, Jordi ^b,c   Prades, Joan Daniel ^c   Cirera, Albert ^c   Morante, Joan Ramon ^c  

^a WALTER SCHOTTKY INSTITUT   (Germany)

^b UNIVERSITY OF BARCELONA   (Spain)

^c UNIVERSITY OF BARCELONA   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; FILM THICKNESS; HEXANE; SILICON; SPUTTERING; SUBSTRATES; SYNTHESIS (CHEMICAL); VACUUM FURNACES;

HYDROGEN FLOW; VAPOR-LIQUID-SOLID (VLS) METHOD; WURTZITE;

NANOWIRES;

EID: 34547157714     PISSN: 09359648     EISSN: None     Source Type: Journal    
DOI: 10.1002/adma.200602318     Document Type: Article

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