Selective diffusion of gold nanodots on nanopatterned substrates realized by self-assembly of diblock copolymers

Journal of Materials Research

Volumn 26, Issue 2, 2011, Pages 240-246

  Garozzo, C ^a   Puglisi, R A ^a   Bongiorno, C ^a   Scalese, S ^a   Rimini, E ^b   Lombardo, S ^a  

^a CNR   (Italy)

^b UNIVERSITY OF CATANIA   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORBER MATERIAL; COST ROUTES; CYLINDRICAL PORES; DIBLOCK COPOLYMER; EX SITU; GOLD NANODOTS; IN-SITU; NANO PATTERN; NANODOTS; NANOPATTERNED SUBSTRATES; OXIDE SUBSTRATES; PATTERNED SUBSTRATES; SEM; SI SUBSTRATES; SIZE AND POSITION; TEM; THERMAL BUDGET; TWO-STEP PROCESS; VAPOR-LIQUID-SOLID;

BLOCK COPOLYMERS; COPOLYMERIZATION; CYLINDERS (SHAPES); DIFFUSION; GOLD COATINGS; GOLD DEPOSITS; GROWTH (MATERIALS); NANOPORES; NANOWIRES; PLASMA ETCHING; SCANNING ELECTRON MICROSCOPY; SELF ASSEMBLY; SILICON; SILICON COMPOUNDS; TRANSMISSION ELECTRON MICROSCOPY;

SUBSTRATES;

EID: 79952407298     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/jmr.2010.19     Document Type: Review

References (27)

1. M.D. Kelzenberg, S.W. Boettcher, J.A. Petykiewicz, D.B. Turner-Evans, M.C. Putnam, E.L. Warren, J.M. Spurgeon, R.M. Briggs, N.S. Lewis, and H.A. Atwater: Enhanced absorption and carrier collection in Si wire arrays for photovoltaic applications. Nat. Mater. 9, 239 (2010).
2. K.R. Catchpole and A. Polman: Design principles for particle plasmon enhanced solar cells. Appl. Phys. Lett. 93, 191113 (2008).
3. S.A. Maier: Plasmonics-Fundamentals and Applications. (Springer, Berlin, 2007).
4. R.S. Wagner and W.C. Ellis: Vapor-liquid-solid mechanism of single crystal growth. Appl. Phys. Lett. 4, 89 (1964).
5. E.I. Givargizov: Fundamental aspects of VLS growth. J. Cryst. Growth 31, 20 (1975).
6. K.W. Kolasinski: Catalytic growth of nanowires: Vapor-liquid-solid, vapor-solid-solid, solution-liquid-solid and solid-liquid-solid growth. Curr. Opin. Solid State Mater. Sci. 10, 182 (2006).
7. M.C. Putnam, M.A. Filler, B.M. Kayes, M.D. Kelzenberg, Y. Guan, N.S. Lewis, J.M. Eiler, and H.A. Atwater: Secondary ion mass spectrometry of vapor-liquid-solid grown, Au-catalyzed, Si wires. Nano Lett. 8, 3109 (2008).
8. S. Perraud, S. Poncet, S. Noël, M. Levis, P. Faucherand, E. Rouvière, P. Thony, C. Jaussaud, and R. Delsol: Full process for integrating silicon nanowire arrays into solar cells. Sol. Energy Mater. Sol. Cells 93, 1568 (2009).
9. L. Latu-Romain, C. Mouchet, C. Cayron, E. Rouvière, and J.P. Simonato: Growth parameters and shape specific synthesis of silicon nanowires by the VLS method. J. Nanopart. Res. 10, 1287 (2008).
10. A. Irrera, E.F. Pecora, and F. Priolo: Control of growth mechanisms and orientation in epitaxial Si nanowires grown by electron beam evaporation. Nanotechnology 20, 135601 (2009).
11. H.J. Fan, P. Werner, and M. Zacharias: Semiconductor nanowires: From self-organization to patterned growth. Small 2, 700 (2006).
12. H.F. Yan, Y.J. Xing, Q.L. Hang, D.P. Yu, Y.P. Wang, J. Xu, Z.H. Xi, and S.Q. Feng: Growth of amorphous silicon nanowires via a solid-liquid-solid mechanism. Chem. Phys. Lett. 323, 224 (2000).
13. D.P. Yu, Y.J. Xing, Q.L. Hang, H.F. Yan, J. Xu, Z.H. Xi, and S.Q. Feng: Controlled growth of oriented amorphous silicon nanowires via a solid-liquid-solid (SLS) mechanism. Physica E 9, 305 (2001).
14. K.W. Guarini, C.T. Black, and S.H.I. Yeung: Optimization of diblock copolymer thin film self assembly. Adv. Mater. 14(18), 1290 (2002).
15. T. Thurn-Albrecht, J. Schotter, G.A. Kastle, N. Emley, T. Shibauchi, L. Krusin-Elbaum, K. Guarini, C.T. Black, M.T. Tuominen, and T.P. Russell: Ultrahigh-density nanowire arrays grown in selfassembled diblock copolymer templates. Science 290, 2126 (2000).
16. S.J. Kim, W.J. Maeng, S.K. Lee, D.H. Park, S.H. Bang, H. Kima, and B.H. Sohn: Hybrid nanofabrication processes utilizing diblock copolymer nanotemplate prepared by self-assembled monolayer based surface neutralization. J. Vac. Sci. Technol., B 26(1), 189 (2008).
17. K.W. Guarini, C.T. Black, Y. Zhang, H. Kim, E.M. Sikorski, and I.V. Babich: Process integration of self-assembled polymer templates into silicon nanofabrication. J. Vac. Sci. Technol., B 20(6), 2788 (2002).
18. K.W. Guarini, C.T. Black, K.R. Milkove, and R.L. Sandstrom: Nanoscale patterning using self-assembled polymers for semiconductor applications. J. Vac. Sci. Technol., B 19(6), 2784 (2001).
19. P. La Fata, R. Puglisi, S. Lombardo, and C. Bongiorno: Nanopatterning with block copolymers. Superlattices Microstruct. 44, 693 (2008).
20. R.A. Puglisi, A. Scandurra, C. Bongiorno, P. La Fata, and S. Lombardo: Pattern transfer of nanomasks based on diblock copolymers through reactive ion etching (to be submitted).
21. P. Mansky, Y. Liu, E. Huang, T.P. Russell, and C. Hawker: Controlling polymer-surface interactions with random copolymer brushes. Science 275, 1458 (1997).
22. R.A. Puglisi, P. La Fata, and S. Lombardo: Tailoring the long-range order of block copolymer based nanomasks on flat substrates. Appl. Phys. Lett. 91, 053104 (2007).
23. S. Ruffell, D.K. Venkatachalam, A. Shalav, and R.G. Elliman: Formation of ordered arrays of gold particles on silicon and silicondioxide by nanoindentation patterning, in Nanoscale Pattern Formation, edited by E. Chason, R. Cuerno, J. Gray, and K.-H. Heinig (Mater. Res. Soc. Symp. Proc. 1228E, Warrendale, PA, 2010), 1228-KK13-05.
24. J.A. Venables: Atomic processes in crystal growth. Surf. Sci. 299/300, 798 (1994).
25. 2. Superlattices Microstruct. 44, 588 (2008).
26. J.E. Allen, E.R. Hemesath, D.E. Perea, J.L. Lensch-Falk, Z.Y. Li, F. Yin, M.H. Gass, P. Wang, A.L. Bleloch, R.E. Palmer, and L.J. Lauhon: High-resolution detection of Au catalyst atoms in Si nanowires. J. Nat. Nanotechol. 3, 168 (2008).
27. W.M. Bullis: Properties of gold in silicon. Solid-State Electron. 9(2), 143 (1966).